SCHEMBL5072199

SCHEMBL5072199

[CH2]CC[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15161714 0.98
SCHEMBL15161785 0.98
SCHEMBL373571 0.87
SCHEMBL15161856 0.86
SCHEMBL15161799 0.84
SCHEMBL15161813 0.84
SCHEMBL15161707 0.82
SCHEMBL15161804 0.82
SCHEMBL15161793 0.82
SCHEMBL15161877 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2767571-B1 FLUORESCENT COMPOUND, METHOD FOR PRODUCING THE SAME, AND FLUORESCENT RESIN COMPOSITION SHINETSU CHEMICAL CO (JP) 2016-12-21 EP disclosed
US-9217071-B2 Fluorescent compound, method for producing the same, and fluorescent resin composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-22 US disclosed
US-9062246-B2 Fluorescent compound, making method, and fluorescent resin composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-23 US disclosed
EP-2626400-B1 Fluorescent compound, making method, and fluorescent resin composition SHINETSU CHEMICAL CO (JP) 2014-10-08 EP disclosed
US-20140235774-A1 FLUORESCENT COMPOUND, METHOD FOR PRODUCING THE SAME, AND FLUORESCENT RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-21 US disclosed
EP-2767571-A1 Fluorescent compound, method for producing the same, and fluorescent resin composition Shin-Etsu Chemical Co., Ltd. (JP) 2014-08-20 EP disclosed
CN-103992344-A Fluorescent compound, method for producing the same, and fluorescent resin composition SHINETSU CHEMICAL CO 2014-08-20 CN disclosed
US-20130207041-A1 FLUORESCENT COMPOUND, MAKING METHOD, AND FLUORESCENT RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-15 US disclosed
EP-2626400-A1 Fluorescent compound, making method, and fluorescent resin composition Shin-Etsu Chemical Co., Ltd. (JP) 2013-08-14 EP disclosed
EP-1904556-A2 POLYASPARTIC ACID DERIVATIVES IN COVERING AGENTS CONTAINING POLYSILOXANE Lanxess Deutschland GmbH (DE) 2008-04-02 EP disclosed
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
WO-2007003264-A2 POLYASPARTIC ACID DERIVATIVES IN COVERING AGENTS CONTAINING POLYSILOXANE LANXESS DEUTSCHLAND GMBH (DE) 2007-01-11 WO disclosed
EP-1518881-A2 Polymer modified by a polyether as adjuvant in leather manufacture Bayer Chemicals AG (DE) 2005-03-30 EP disclosed
US-20050058619-A1 Polyether-modified polymers as leather auxiliaries LANXESS DEUTSCHLAND GMBH (DE) 2005-03-17 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed