⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1136084 | 0.81 | — | — | |
| SCHEMBL23282538 | 0.78 | — | — | |
| SCHEMBL5074361 | 0.77 | — | — | |
| SCHEMBL814108 | 0.76 | — | — | |
| SCHEMBL107222 | 0.75 | — | — | |
| SCHEMBL5916855 | 0.74 | — | — | |
| SCHEMBL329893 | 0.73 | — | — | |
| SCHEMBL5916502 | 0.69 | — | — | |
| SCHEMBL19732674 | 0.68 | — | — | |
| SCHEMBL28378603 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10995268-B2 | Etching composition effective to selectively wet etch a silicon nitride film | LTCAM CO., LTD. (KR) | 2021-05-04 | — | — | US | disclosed |
| CN-110551503-B | Composition for wet etching silicon nitride | LTCAM株式会社 | 2021-04-16 | — | — | CN | disclosed |
| CN-110551503-A | Composition for wet etching silicon nitride | LTCAM CO LTD | 2019-12-10 | — | — | CN | disclosed |
| EP-1245585-B1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORP (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-6838538-B2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040197484-A1 | Coating liquid for forming insulating film and method for producing insulating film | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-10-07 | — | — | US | disclosed |
| US-20030100683-A1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2003-05-29 | — | — | US | disclosed |
| EP-1245585-A2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |