SCHEMBL5075434

SCHEMBL5075434

COC1(F)C(F)(F)C(F)(F)C1(F)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7451751 0.92
SCHEMBL3896029 0.88 MEN1 (0.31)
SCHEMBL6140743 0.88 MEN1 (0.31)
SCHEMBL23609570 0.79
SCHEMBL14181169 0.79
SCHEMBL11880883 0.77
SCHEMBL11879654 0.77
SCHEMBL11859505 0.74
SCHEMBL11879982 0.74
SCHEMBL12761394 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110245429-A1 Cross Linked Organic Conductive Layer GOUGH, NEIL (GB) 2011-10-06 US disclosed
US-20080274334-A1 Dry Etching Gas and Method of Dry Etching NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-11-06 US disclosed
US-7368514-B2 Siloxane monomer containing trifluorovinylether group and sol-gel hybrid polymer prepared by using the same GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2008-05-06 US disclosed
US-7368514-B2 Siloxane monomer containing trifluorovinylether group and sol-gel hybrid polymer prepared by using the same GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2008-05-06 US disclosed
EP-1760769-A1 DRY ETCHING GASES AND METHOD OF DRY ETCHING National Institute of Advanced Industrial Science and Technology (JP) 2007-03-07 EP disclosed