SCHEMBL5076321

SCHEMBL5076321

N[C@@H](CCC(=O)OC(=O)CCCC(=O)OC(=O)CC[C@H](N)C(=O)O)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSR P00390 2/20 0.56
SLC1A1 P43005 2/20 0.56
CYP1A2 P05177 2/20 0.56
GRM8 O00222 1/20 0.56
GRM6 O15303 1/20 0.56
GRIN2D O15399 1/20 0.56
GRIN3B O60391 1/20 0.56
GRIK1 P39086 1/20 0.56
GRM5 P41594 1/20 0.56
GRIA1 P42261 1/20 0.56
GRIA2 P42262 1/20 0.56
GRIA3 P42263 1/20 0.56
SLC1A3 P43003 1/20 0.56
SLC1A2 P43004 1/20 0.56
GRIA4 P48058 1/20 0.56
GRIN1 Q05586 1/20 0.56
GRIN2A Q12879 1/20 0.56
GRIK2 Q13002 1/20 0.56
GRIK3 Q13003 1/20 0.56
GRIN2B Q13224 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29140278 0.94 GRM8 (0.61) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL6384113 0.93 GSR (0.48) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL27970765 0.91 SLC1A1 (0.60) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL28203156 0.91 SLC1A1 (0.60) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL7294293 0.91 SLC1A1 (0.60) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL28015254 0.91 SLC1A1 (0.60) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL25384083 0.90 GSR (0.57) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL16291403 0.90 GSR (0.57) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL3488547 0.90 GSR (0.57) GSRSLC1A1CYP1A2GRM8GRM6
SCHEMBL15300087 0.89 GSR (0.60) GSRSLC1A1CYP1A2GRM8GRM6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1997129-A2 LOW PH POST-CMP RESIDUE REMOVAL COMPOSITION AND METHOD OF USE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2008-12-03 EP claimed
WO-2007092800-A2 LOW PH POST-CMP RESIDUE REMOVAL COMPOSITION AND METHOD OF USE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2007-08-16 WO claimed
CN-117224593-A Compositions and methods for managing or improving bone disorders, cartilage disorders, or both 尤尼根公司 2023-12-15 CN disclosed
CN-116904118-A Composition for semiconductor process and method for manufacturing semiconductor device using the same SK恩普士有限公司 2023-10-20 CN disclosed
CN-116785342-A Compositions and methods for managing or improving bone disorders, cartilage disorders, or both 尤尼根公司 2023-09-22 CN disclosed
CN-115260542-A Preparation method of degradable polymer/starch masterbatch 湖北宜化降解新材料有限公司 2022-11-01 CN disclosed