⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5081893 | 0.78 | — | — | |
| Water SCHEMBL17582692 | 0.76 | — | — | |
| SCHEMBL15351990 | 0.69 | — | — | |
| SCHEMBL457485 | 0.67 | — | — | |
| SCHEMBL1559869 | 0.65 | — | — | |
| SCHEMBL1818675 | 0.65 | — | — | |
| SCHEMBL5077516 | 0.63 | — | — | |
| SCHEMBL1566141 | 0.62 | HDAC3 (0.35) | — | |
| SCHEMBL21630086 | 0.61 | — | — | |
| SCHEMBL8845415 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274334-A1 | Dry Etching Gas and Method of Dry Etching | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-1760769-A1 | DRY ETCHING GASES AND METHOD OF DRY ETCHING | National Institute of Advanced Industrial Science and Technology (JP) | 2007-03-07 | — | — | EP | disclosed |