⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5078688 | 1.00 | — | — | |
| SCHEMBL36438 | 0.78 | — | — | |
| SCHEMBL15759878 | 0.77 | — | — | |
| Tetrafluoroethylene SCHEMBL10597482 | 0.75 | — | — | |
| Methane SCHEMBL27958200 | 0.75 | — | — | |
| SCHEMBL868919 | 0.69 | — | — | |
| SCHEMBL6141069 | 0.69 | — | — | |
| SCHEMBL24414544 | 0.67 | — | — | |
| SCHEMBL18373142 | 0.67 | — | — | |
| SCHEMBL1898561 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274334-A1 | Dry Etching Gas and Method of Dry Etching | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-1760769-A1 | DRY ETCHING GASES AND METHOD OF DRY ETCHING | National Institute of Advanced Industrial Science and Technology (JP) | 2007-03-07 | — | — | EP | disclosed |