SCHEMBL5079252

SCHEMBL5079252

CC1=C(C)CC([Zr]C2=CC(C)=C(C)C2)=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6914603 0.73
SCHEMBL4652308 0.67
SCHEMBL1027102 0.67
SCHEMBL14324899 0.67
Hydrochloric Acid SCHEMBL9559175 0.61
SCHEMBL7052021 0.59
SCHEMBL15241166 0.58
Hydrochloric Acid SCHEMBL715937 0.57
Hydrochloric Acid SCHEMBL8858630 0.54
SCHEMBL16572713 0.51

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1873172-A2 Propylene polymer and composition containing the same, molded object and laminate comprising these, and processes for producing propylene polymer and composition containing the same Idemitsu Kosan Co., Ltd. (JP) 2008-01-02 EP disclosed
EP-1867662-A2 Propylene polymer and composition containing the same, molded object and laminate comprising these, and processes for producing propylene polymer and composition containing the same Idemitsu Kosan Co., Ltd. (JP) 2007-12-19 EP disclosed
EP-1867663-A2 Propylene polymer and composition containing the same, molded object and laminate comprising these, and processes for producing propylene polymer and composition containing the same Idemitsu Kosan Co., Ltd. (JP) 2007-12-19 EP disclosed