Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL138365 | 0.94 | MEN1 (0.46) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL17289024 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL54795 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL1255907 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL4471345 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL1007306 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL7758766 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL11045817 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL619676 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL11582675 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113345624-A | Insulating coated conductive particle, anisotropic conductive adhesive, and connection structure | 昭和电工材料株式会社 | 2021-09-03 | — | — | CN | disclosed |
| CN-108604480-B | Conductive particle, insulation-coated conductive particle, anisotropic conductive adhesive, connection structure, and method for producing conductive particle | 日立化成株式会社 | 2020-03-24 | — | — | CN | disclosed |
| CN-108701508-B | Conductive particle, insulation-coated conductive particle, anisotropic conductive adhesive, connection structure, and method for producing conductive particle | 日立化成株式会社 | 2020-03-24 | — | — | CN | disclosed |
| US-20140217328-A1 | Electroless Plating in Microchannels | VELOCYS INC (US) | 2014-08-07 | — | — | US | disclosed |
| US-8648006-B2 | Electroless plating in microchannels | VELOCYS, INC. (US) | 2014-02-11 | — | — | US | disclosed |
| EP-1934383-B1 | ELECTROLESS PLATING IN MICROCHANNELS | VELOCYS INC (US) | 2012-11-14 | — | — | EP | disclosed |
| US-20080214884-A1 | Electroless plating in microchannels | VELOCYS INC. (US) | 2008-09-04 | — | — | US | disclosed |
| EP-1934383-A2 | ELECTROLESS PLATING IN MICROCHANNELS | Velocys, Inc. (US) | 2008-06-25 | — | — | EP | disclosed |
| WO-2007047374-A2 | ELECTROLESS PLATING IN MICROCHANNELS | VELOCYS, INC. (US) | 2007-04-26 | — | — | WO | disclosed |