⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2240198 | 0.81 | — | — | |
| SCHEMBL14956658 | 0.72 | TSHR (0.35) | — | |
| SCHEMBL6308113 | 0.66 | — | — | |
| SCHEMBL4309 | 0.66 | — | — | |
| SCHEMBL14750166 | 0.63 | — | — | |
| SCHEMBL5014799 | 0.62 | — | — | |
| SCHEMBL18575052 | 0.62 | — | — | |
| Water SCHEMBL7852378 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL971324 | 0.62 | — | — | |
| SCHEMBL9780539 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114106458-A | Irradiation modified PP melt-blown material and composite forming process thereof | 中核同辐（长春）辐射技术有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-110036318-B | Composition for black matrix, and method for producing black matrix | 夏普株式会社 | 2021-10-08 | — | — | CN | disclosed |
| US-11028270-B2 | Black matrix composition, black matrix, and black matrix production method | MERCK PATENT GMBH (DE) | 2021-06-08 | — | — | US | disclosed |
| US-20200277494-A1 | BLACK MATRIX COMPOSITION, BLCK MATRIX, AND BLACK MATRIX PRODUCTION METHOD | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2020-09-03 | — | — | US | disclosed |
| US-10106428-B2 | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-10-23 | — | — | US | disclosed |
| US-20170190586-A1 | METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SURFACE-MODIFIED SILICA NANOPARTICLES | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-07-06 | — | — | US | disclosed |
| EP-3153470-A1 | METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SURFACE-MODIFIED SILICA NANOPARTICLES | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-04-12 | — | — | EP | disclosed |
| CN-105316668-A | Aquosity metal finishing composition | KANSAI PAINT CO LTD | 2016-02-10 | — | — | CN | disclosed |
| US-7466893-B2 | Curable resin composition for light guide formation, curable dry film for light guide formation, cured resin and light guide | KANSAI PAINT CO., LTD. (JP) | 2008-12-16 | — | — | US | disclosed |
| US-20080226245-A1 | Epoxy resin that is modified with a tetraalkoxysilane or alkyltrialkoxysilane to form a hydrolyzable resin and another resin that is reactive with an epoxy group, such as an acrylic acid-acrylate copolymer; optical waveguides with high heat resistance, excellent mechanical strength and transparency | KANSAI PAINT CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-6993231-B2 | comprises polyesterurethanes/polyetherurethanes; highly elasticity/flexibility; improved heat stability/transmission | KANSAI PAINT CO., LTD. (JP) | 2006-01-31 | — | — | US | disclosed |
| US-20040151457-A1 | Covering composition for optical fiber and covered optical fiber | KANSAI PAINT CO., LTD. | 2004-08-05 | — | — | US | disclosed |
| US-5731037-A | CONTROLLING SURFACE MOISTURE OF BUILDING MATERIAL | KANSAI PAINT CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |