SCHEMBL5084397

SCHEMBL5084397

CC(C)C1C(=O)OC(=O)C1C(C)C

nearest known ligand 0.31

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
PPM1B O75688 1/20 0.31
LMNA P02545 1/20 0.31
PPP1CC P36873 1/20 0.31
TFPI2 P48307 1/20 0.31
RAB9A P51151 1/20 0.31
PPP5C P53041 1/20 0.31
PPP1CA P62136 1/20 0.31
PMP22 Q01453 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 1/20 0.31
CYP2D6 P10635 1/20 0.31
NFKB1 P19838 1/20 0.31
THPO P40225 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13953344 1.00 KDM4E (0.31) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL5084396 1.00 KDM4E (0.31) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL15113030 0.92
SCHEMBL17833916 0.86 KDM4E (0.37) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL14571318 0.84 KDM4E (0.36) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL12673924 0.84
SCHEMBL16683502 0.84
SCHEMBL18624674 0.82
SCHEMBL20048984 0.80
SCHEMBL12199448 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230290951-A1 ELECTRODE, ELECTROCHEMICAL ELEMENT, LIQUID COMPOSITION, AND METHOD FOR PRODUCING ELECTRODE RICOH COMPANY, LTD. (JP) 2023-09-14 US disclosed
US-9929364-B2 Soluble cyclic imides containing polymers as dielectrics in organic electronic applications BASF SE (DE) 2018-03-27 US disclosed
US-9748576-B2 Polymer, binder and negative electrode including the polymer, and lithium battery including the negative electrode SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-08-29 US disclosed
EP-2141544-B1 Photosensitive composition and pattern forming method using same FUJIFILM CORP (JP) 2017-04-12 EP disclosed
US-20170073569-A1 Maleic Anhydride Polymers and Methods of Treating Subterranean Formations ARAMCO SERVICES COMPANY 2017-03-16 US disclosed
US-9175036-B2 Antimicrobial water treatment membranes and production thereof BEN-GURION UNVERSITY OF THE NEGEV RESEARCH AND DEVELOPMENT AUTHORITY (IL) 2015-11-03 US disclosed
WO-2014142360-A1 METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-09-18 WO disclosed
US-20140238939-A1 IMMOBILIZATION OF ANTIMICROBIAL POLYMERS ON RO MEMBRANE TO REDUCE BIOFILM GROWTH AND BIOFOULING WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2014-08-28 US disclosed
WO-2013129702-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PHOTOMASK BLANK AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-09-06 WO disclosed
WO-2013125733-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-08-29 WO disclosed
US-20090247798-A1 NORBORNENE DERIVATIVE, NORBORNENE POLYMER PRODUCED BY RING-OPENING (CO)POLYMERIZATION, AND PROCESS FOR PRODUCING THE POLYMER BY RING-OPENING (CO)POLYMERIZATION JSR CORPORATION (JP) 2009-10-01 US disclosed
US-7541411-B2 Norbornene derivative, norbornene polymer produced by ring-opening (co)polymerization, and process for producing the polymer by ring-opening (co)polymerization JSR CORPORATION (JP) 2009-06-02 US disclosed
EP-1912936-A2 STEREOSELECTIVE SYNTHESIS OF 3,4-DISUBSTITUTED CYCLOPENTANONES AND RELATED COMPOUNDS Pharmacia & Upjohn Company LLC (US) 2008-04-23 EP disclosed
EP-1906238-A2 Photosensitive composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
EP-1816519-A1 Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition FUJIFILM Corporation (JP) 2007-08-08 EP disclosed
US-7230058-B2 Ring-opened polynorbornenes JSR CORPORATION (JP) 2007-06-12 US disclosed
US-20070065747-A1 Norbornene derivative, norbornene polymer produced by ring-opening (co)polymerization, and process for producing the polymer by ring-opening (co)polymerization JSR CORPORATION (JP) 2007-03-22 US disclosed
EP-1754999-A2 Positive resist composition and method of pattern formation with the same Fuji Photo Film Co., Ltd. (JP) 2007-02-21 EP disclosed
WO-2007010387-A2 STEREOSELECTIVE SYNTHESIS OF 3,4-DISUBSTITUTED CYCLOPENTANONES AND RELATED COMPOUNDS PHARMACIA & UPJOHN COMPANY LLC (US) 2007-01-25 WO disclosed
US-7157523-B2 Ring-opened polynorbornenes JSR CORPORATION (JP) 2007-01-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090247798-A1 NORBORNENE DERIVATIVE, NORBORNENE POLYMER PRODUCED BY RING-OPENING (CO)POLYMERIZATION, AND PROCESS FOR PRODUCING THE POLYMER BY RING-OPENING (CO)POLYMERIZATION COASY, SQLE, CYP51A1 KDM4E 4387/4885GMNN 955/4885PPM1B 4827/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.