SCHEMBL5085555

SCHEMBL5085555

CCC(c1ccccc1)=[Zr](C1=CC(C2(C)C3CC4CC(C3)CC2C4)=CC1C)C1c2cc(C)c(C(C)(C)C)cc2-c2cc(C(C)(C)C)c(C)cc21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5082502 0.85
SCHEMBL5079488 0.82
SCHEMBL5085553 0.80
Hydrochloric Acid SCHEMBL1237426 0.77
Hydrochloric Acid SCHEMBL1236831 0.76
SCHEMBL17818143 0.75
SCHEMBL5155276 0.75
SCHEMBL5153153 0.74
Hydrochloric Acid SCHEMBL1237168 0.74
SCHEMBL5156972 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080097055-A1 Process for Producing Propylene Polymer MITSUI CHEMICALS, INC. (JP) 2008-04-24 US disclosed