SCHEMBL5095455

SCHEMBL5095455

OC1=NCCC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14277232 0.64
SCHEMBL19142551 0.56
SCHEMBL9909114 0.56
SCHEMBL1875830 0.55
SCHEMBL6360329 0.55
SCHEMBL8882266 0.54
SCHEMBL19886832 0.54
SCHEMBL1876497 0.53
SCHEMBL10840770 0.53
SCHEMBL10840182 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7462438-B2 Resist material and pattern formation method using the same PANASONIC CORPORATION (JP) 2008-12-09 US claimed
US-20060263719-A1 Resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2006-11-23 US claimed
CN-1866129-A Resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2006-11-22 CN claimed
US-7462438-B2 Resist material and pattern formation method using the same PANASONIC CORPORATION (JP) 2008-12-09 US disclosed
US-20060263719-A1 Resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2006-11-23 US disclosed
CN-1866129-A Resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2006-11-22 CN disclosed