SCHEMBL5111309

SCHEMBL5111309

[CH2]COCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8541520 0.82
SCHEMBL9488906 0.79 MEN1 (0.42)
SCHEMBL2487 0.71
SCHEMBL67589 0.71
SCHEMBL5119253 0.69
SCHEMBL105641 0.69
Methane SCHEMBL8709065 0.67
SCHEMBL190431 0.65 MEN1 (0.69)
SCHEMBL187893 0.65
SCHEMBL2701918 0.65 MEN1 (0.69)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116710450-A Pyrrolo [3,2-b ] pyridine derivatives for the treatment of cGAS-related disorders 诺华股份有限公司 2023-09-05 CN claimed
CN-116635382-A Indole derivatives useful for treating cGAS-related disorders 诺华股份有限公司 2023-08-22 CN claimed
CN-109153658-B Oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition 株式会社三养社 2022-11-22 CN claimed
CN-107422603-B Photosensitive resin composition and photocured pattern produced therefrom 东友精细化工有限公司 2022-03-08 CN claimed
CN-113227050-A Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing carbazole poly-beta-oxime ester derivative compound, and photoresist composition 株式会社三养社 2021-08-06 CN claimed
EP-3095778-B1 OXIME ESTER FLUORENE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING IT, PHOTORESIST COMPOSITION, USES OF THE PHOTORESIST COMPOSITION SAMYANG CORP (KR) 2020-12-16 EP claimed
WO-2020139042-A2 CARBAZOLE MULTI BETA OXIME ESTER DERIVATIVE COMPOUND AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME 주식회사 삼양사 2020-07-02 WO claimed
CN-107250105-B Novel oxime ester derivative compound, Photoepolymerizationinitiater initiater and photo-corrosion-resisting agent composition comprising it 韩国化学研究院 2019-08-20 CN claimed
EP-2845845-B1 NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME KOREA RES INST CHEMICAL TECH (KR) 2019-07-03 EP claimed
CN-109896990-A Carbazole oxime ester derivative compound and Photoepolymerizationinitiater initiater and photosensitive composition containing the compound 株式会社三养社 2019-06-18 CN claimed
US-9873663-B2 Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same SAMYANG CORPORATION (KR) 2018-01-23 US claimed
CN-107422603-A Photosensitive polymer combination and the photocuring pattern being produced from it 东友精细化工有限公司 2017-12-01 CN claimed
CN-107250105-A New oxime ester derivative compound, Photoepolymerizationinitiater initiater and photo-corrosion-resisting agent composition comprising it 韩国化学研究院 2017-10-13 CN claimed
EP-3095778-A1 NOVEL -OXIMESTER FLUORENE COMPOUND, A PHOTOPOLYMERIZATION INITIATOR COMPRISING SAME, AND PHOTORESIST COMPOSITION Samyang Corporation (KR) 2016-11-23 EP claimed
US-20160332960-A1 NOVEL FLUORENYL B-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME SAMYANG CORPORATION (KR) 2016-11-17 US claimed
CN-105916837-A Novel beta-oxime ester fluorene compound, photopolymerization initiator comprising same, and photoresist composition 三养社 2016-08-31 CN claimed
US-9316906-B2 Fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2016-04-19 US claimed
CN-104661997-A Novel fluorene oxime ester compound, and photopolymerization initiator and photoresist composition containing same KOREA RES INST CHEM TECH 2015-05-27 CN claimed
US-20150111152-A1 NOVEL FLUORENE OXIME ESTER COMPOUND, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2015-04-23 US claimed
EP-2845845-A1 NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME Korea Research Institute of Chemical Technology (KR) 2015-03-11 EP claimed