⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27875542 | 0.82 | — | — | |
| SCHEMBL58777 | 0.82 | — | — | |
| Fluoride SCHEMBL701367 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL586751 | 0.73 | — | — | |
| Iodide SCHEMBL329454 | 0.73 | — | — | |
| Methane SCHEMBL23070747 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL23701214 | 0.73 | — | — | |
| SCHEMBL20240849 | 0.73 | — | — | |
| SCHEMBL17202621 | 0.73 | — | — | |
| SCHEMBL7053007 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 443 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6348725-B1 | — | — | None | — | — | US | claimed |
| CN-112390656-B | Method for continuously preparing ceramic matrix composite material section bar and section bar prepared by method | 北京信汇碳硅科技有限公司 | 2022-12-20 | — | — | CN | claimed |
| CN-112390656-A | Method for continuously preparing ceramic matrix composite material section bar and section bar prepared by method | 北京信汇碳硅科技有限公司 | 2021-02-23 | — | — | CN | claimed |
| US-20190221771-A1 | BUFFER LAYER FOR ORGANIC LIGHT EMITTING DEVICES AND METHOD OF MAKING THE SAME | UNIVERSAL DISPLAY CORPORATION | 2019-07-18 | — | — | US | claimed |
| US-20170117503-A1 | BUFFER LAYER FOR ORGANIC LIGHT EMITTING DEVICES AND METHOD OF MAKING THE SAME | UNIVERSAL DISPLAY CORPORATION | 2017-04-27 | — | — | US | claimed |
| US-20160118621-A1 | HYBRID BARRIER LAYER FOR SUBSTRATES AND ELECTRONIC DEVICES | UNIVERSAL DISPLAY CORPORATION | 2016-04-28 | — | — | US | claimed |
| WO-2015002756-A1 | HYBRID BARRIER LAYER FOR SUBSTRATES AND ELECTRONIC DEVICES | UNIVERSAL DISPLAY CORPORATION (US) | 2015-01-08 | — | — | WO | claimed |
| US-7951730-B2 | Decreasing the etch rate of silicon nitride by carbon addition | APPLIED MATERIALS, INC. (US) | 2011-05-31 | — | — | US | claimed |
| EP-2087146-A1 | MULTILAYERED COATINGS FOR USE ON ELECTRONIC DEVICES OR OTHER ARTICLES | The Trustees of Princeton University (US) | 2009-08-12 | — | — | EP | claimed |
| US-7563728-B2 | Methods of modifying interlayer adhesion | APPLIED MATERIALS, INC. (US) | 2009-07-21 | — | — | US | claimed |
| EP-1148539-A2 | Method of depositing low K films using an oxidizing plasma | APPLIED MATERIALS, INC. (US) | 2001-10-24 | — | — | EP | claimed |
| US-20010026849-A1 | Method of improving moisture resistance of low dielectric constant films | APPLIED MATERIALS, INC. | 2001-10-04 | — | — | US | claimed |
| EP-1131846-A1 | CVD NANOPOROUS SILICA LOW DIELECTRIC CONSTANT FILMS | Applied Materials, Inc. (US) | 2001-09-12 | — | — | EP | claimed |
| EP-1119035-A2 | Method for depositing a low dielectric constant film | Applied Materials, Inc. (US) | 2001-07-25 | — | — | EP | claimed |
| US-20010005546-A1 | PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. | 2001-06-28 | — | — | US | claimed |
| US-6245690-B1 | EXPOSING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED FILM OF OXIDIZED ORGANOSILICON COMPOUND TO A HYDROPHOBIC-IMPARTING SURFACTANT SUCH AS HEXAMETHYLDISILAZANE PRIOR TO THERMALLY CURING TO CONTROL CARBON CONTENT IN DEPOSITED FILM | APPLIED MATERIALS, INC. | 2001-06-12 | — | — | US | claimed |
| US-6171945-B1 | CVD nanoporous silica low dielectric constant films | APPLIED MATERIALS, INC. | 2001-01-09 | — | — | US | claimed |
| EP-1063692-A1 | Process for depositing a low dielectric constant film | Applied Materials, Inc. (US) | 2000-12-27 | — | — | EP | claimed |
| WO-2000024050-A1 | CVD NANOPOROUS SILICA LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. (US) | 2000-04-27 | — | — | WO | claimed |
| EP-0224360-B1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1992-04-08 | — | — | EP | claimed |