SCHEMBL513239

SCHEMBL513239

[CH2]OCOCCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL875852 0.92
SCHEMBL875195 0.90 HTT (0.48)
SCHEMBL15485872 0.90 HTT (0.48)
SCHEMBL514090 0.82
SCHEMBL302981 0.82 TSHR (0.55)
SCHEMBL1647546 0.79 TSHR (0.52)
SCHEMBL8130254 0.78 TSHR (0.52)
SCHEMBL3800942 0.78 TSHR (0.52)
SCHEMBL618226 0.78
SCHEMBL6655533 0.78 TSHR (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109459914-B Photocurable resin composition and use thereof 常州强力先端电子材料有限公司 2021-07-13 CN claimed
CN-109459914-A Light curing resin composition and its application 常州强力先端电子材料有限公司 2019-03-12 CN claimed
CN-118359654-A Silane compound, application thereof and photosensitive resin composition 北京鼎材科技有限公司 2024-07-19 CN disclosed
WO-2024134926-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT 株式会社レゾナック 2024-06-27 WO disclosed
CN-118222209-A Black optical film, cured film and application thereof 杭州福斯特电子材料有限公司 2024-06-21 CN disclosed
CN-118109069-A Resin composition, cured product, and method for producing cured product 东京应化工业株式会社 2024-05-31 CN disclosed
CN-118108899-A Curable resin composition, cured product, and method for producing cured product 东京应化工业株式会社 2024-05-31 CN disclosed
CN-117999296-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-07 CN disclosed
CN-117980347-A Photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117980346-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117980368-A Resin precursor, resin composition, and resin cured film 株式会社力森诺科 2024-05-03 CN disclosed
EP-2336104-A1 ORTHO-SUBSTITUTED HALOALKYLSULFONANILIDE DERIVATIVE AND HERBICIDE Nissan Chemical Industries, Ltd. (JP) 2011-06-22 EP disclosed
EP-1329160-A2 4-ACYLAMINOPYRAZOLE DERIVATIVES Sankyo Company, Limited (JP) 2003-07-23 EP disclosed
EP-0763524-B1 Urea and amide derivatives having ACAT inhibitory activity, their preparation and their therapeutic and prophylactic use SANKYO CO (JP) 2000-08-23 EP disclosed
US-6040339-A TREATMENT AND PROPHYLAXIS OF HYPERCHOLESTEREMIA OR ARTERIOSCLEROSIS IN A MAMMAL SANKYO COMPANY, LIMITED (JP) 2000-03-21 US disclosed
US-5880147-A Amide derivatives having ACAT inhibitory activity, their preparation and their therapeutic and prohylactic use SANKYO COMPANY, LIMITED (JP) 1999-03-09 US disclosed
EP-0763524-A1 Urea and amide derivatives having ACAT inhibitory activity, their preparation and their therapeutic and prophylactic use SANKYO COMPANY LIMITED (JP) 1997-03-19 EP disclosed
US-4909833-A A 4-chlorophenyl ring substituted in position 1 of a triazolin-5-one ring NIHON NOHYAKU CO., LTD. (JP) 1990-03-20 US disclosed
US-4845232-A DIAZOTIZATION, ETHERIFICATION, CHLORINATION NIHON NOHYAKU CO., LTD. (JP) 1989-07-04 US disclosed
EP-0220952-A1 Process for producing 1,2,4-triazolin-5-one derivatives, and intermediates therefor NIHON NOHYAKU CO., LTD. (JP) 1987-05-06 EP disclosed