⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14954007 | 0.79 | — | — | |
| SCHEMBL586944 | 0.71 | — | — | |
| SCHEMBL10608984 | 0.69 | — | — | |
| Bromide SCHEMBL14954245 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL5278127 | 0.69 | — | — | |
| SCHEMBL14954489 | 0.69 | — | — | |
| Fluoride SCHEMBL14954032 | 0.69 | — | — | |
| Iodide SCHEMBL14953800 | 0.69 | — | — | |
| Carbon Monoxide SCHEMBL10605808 | 0.65 | — | — | |
| SCHEMBL3894431 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118275477-A | Condensate precursor and contaminant purge apparatus and method | FEI 公司 | 2024-07-02 | — | — | CN | claimed |
| EP-4029675-B1 | 3D-PRINTING METHODS AND SYSTEMS | BOSTIK SA (FR) | 2024-05-29 | — | — | EP | claimed |
| CN-115591545-B | Preparation method and catalytic application of osmium-based solid solution material | 西安交通大学 | 2024-01-26 | — | — | CN | claimed |
| CN-115591545-A | Preparation method and catalytic application of osmium-based solid solution material | 西安交通大学（CN） | 2023-01-13 | — | — | CN | claimed |
| EP-1153905-A1 | NOVEL CRYSTALLINE ION-ASSOCIATION SUBSTANCE, PROCESS FOR PRODUCING THE SAME, AND POLYMERIZATION INITIATOR | AUTEX, INC. (JP) | 2001-11-14 | — | — | EP | claimed |
| EP-4591122-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | Lam Research Corporation (US) | 2025-07-30 | — | — | EP | disclosed |
| WO-2025058006-A1 | PHOTOCURABLE ADHESIVE COMPOSITION, BONDED BODY, AND 2-CYANOACRYLATE COMPOSITION FOR PHOTOCURABLE ADHESIVE | 東亞合成株式会社 | 2025-03-20 | — | — | WO | disclosed |
| WO-2025047585-A1 | METHOD FOR PRODUCING JOINED BODY | 東亞合成株式会社 | 2025-03-06 | — | — | WO | disclosed |
| CN-119451941-A | Bio-based cyanoacrylate compounds | 博斯蒂克股份公司 | 2025-02-14 | — | — | CN | disclosed |
| WO-2024233496-A1 | OXIDATIVE SURFACE TREATMENTS ON UNDERLAYERS TO REDUCE THE DOSE TO SIZE OF EUV PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2024-11-14 | — | — | WO | disclosed |
| CN-118275477-A | Condensate precursor and contaminant purge apparatus and method | FEI 公司 | 2024-07-02 | — | — | CN | disclosed |
| WO-2024064071-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2024-03-28 | — | — | WO | disclosed |
| US-20020004293-A1 | Method of growing electrical conductors | ASM INTERNATIONAL N.V. (NL) | 2002-01-10 | — | — | US | disclosed |
| EP-0769721-B1 | Photocurable composition | THREE BOND CO LTD (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1153905-A1 | NOVEL CRYSTALLINE ION-ASSOCIATION SUBSTANCE, PROCESS FOR PRODUCING THE SAME, AND POLYMERIZATION INITIATOR | AUTEX, INC. (JP) | 2001-11-14 | — | — | EP | disclosed |
| EP-1124159-A1 | Photocurable composition | THREE BOND CO., LTD. (JP) | 2001-08-16 | — | — | EP | disclosed |
| EP-0769721-A1 | Photocurable composition | THREE BOND CO., LTD. (JP) | 1997-04-23 | — | — | EP | disclosed |
| US-4891050-A | OXIDATION CATALYSTS | FUEL TECH, INC. (US) | 1990-01-02 | — | — | US | disclosed |
| WO-1986003492-A1 | FUEL ADDITIVES AND FUEL CONTAINING SOLUBLE PLATINUM GROUP METAL COMPOUNDS AND USE IN INTERNAL COMBUSITON ENGINES | FUEL TECH, INC. (US) | 1986-06-19 | — | — | WO | disclosed |
| US-4138411-A | RUTHENIUM OR OSMIUM CATALYST | RHONE-POULENC S. A. (FR) | 1979-02-06 | — | — | US | disclosed |