SCHEMBL5140786

SCHEMBL5140786

CC=CF.[NaH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL727778 0.94
SCHEMBL14006486 0.94
SCHEMBL461691 0.94
SCHEMBL245651 0.94
Fluoride SCHEMBL11144397 0.89
Hydrochloric Acid SCHEMBL27501446 0.89
SCHEMBL11771703 0.80
SCHEMBL11771714 0.80
Tetrafluoroethylene SCHEMBL28098520 0.77
Ethylene Glycol SCHEMBL1057487 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3521376-A1 WATER-ABSORBING RESIN COMPOSITION Nippon Shokubai Co., Ltd. (JP) 2019-08-07 EP disclosed
EP-0876888-B1 Process for producing water-absorbing resins NIPPON CATALYTIC CHEM IND (JP) 2012-12-12 EP disclosed
EP-1987892-A1 METHOD FOR PRODUCING FUNCTIONAL MEMBRANE TOAGOSEI CO., LTD. (JP) 2008-11-05 EP disclosed
US-20060140891-A1 Cosmetic composition KAO CORPORATION (JP) 2006-06-29 US disclosed
EP-1561456-A1 COSMETIC COMPOSITIONS Kao Corporation (JP) 2005-08-10 EP disclosed
EP-1561455-A1 COSMETIC COMPOSITION Kao Corporation (JP) 2005-08-10 EP disclosed
US-20040145643-A1 Transfer medium for inkjet recording and image formation method FUJI PHOTO FILM CO., LTD. 2004-07-29 US disclosed
US-5576393-A NARROW PARTICLE SIZE DISTRIBUTION; EMULSION POLYMERIZATION RICOH COMPANY, LTD. (JP) 1996-11-19 US disclosed
US-5541031-A SPHERICAL PARTICLES WITH PROTRUSIONS ON SURFACE AND NARROW PARTICLE SIZE DISTRIBUTION RICOH COMPANY, LTD. (JP) 1996-07-30 US disclosed