SCHEMBL5142647

SCHEMBL5142647

O=C(O)CC(=O)c1ccccc1.[Tl]

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.76
MEN1 O00255 2/20 0.76
CYP3A4 P08684 2/20 0.76
HPGD P15428 2/20 0.76
MAPK1 P28482 2/20 0.76
MAPT P10636 2/20 0.76
TDP1 Q9NUW8 2/20 0.76
KDM4E B2RXH2 1/20 0.76
ALOX15 P16050 1/20 0.76
CES1 P23141 1/20 0.76
SMN1; SMN2 Q16637 1/20 0.76
PTPN1 P18031 2/20 0.64
ERCC5 P28715 2/20 0.64
FEN1 P39748 2/20 0.64
NR4A2 P43354 1/20 0.60
ALDH1A1 P00352 4/20 0.59
NPC1 O15118 3/20 0.59
RAB9A P51151 3/20 0.59
HIF1A Q16665 2/20 0.59
CYP2C19 P33261 2/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL98540 0.97 KMT2A (0.80) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL28519781 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL28173667 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL27915275 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL28418364 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
Ammonia Solution, Strong SCHEMBL14935544 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL527869 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL27897747 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL5144883 0.95 CYP3A4 (0.76) KMT2AMEN1CYP3A4HPGDMAPK1
SCHEMBL441330 0.95 KMT2A (0.76) KMT2AMEN1CYP3A4HPGDMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1391476-B1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2015-12-09 EP disclosed
US-7312013-B2 Photoreactive composition SEKISUI CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed