SCHEMBL5145279

SCHEMBL5145279

[Ni].[PbH2].[SnH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28330173 0.87
SCHEMBL29014471 0.87
SCHEMBL273054 0.82
SCHEMBL7217127 0.67
SCHEMBL21633776 0.67
SCHEMBL25167177 0.67
SCHEMBL15578189 0.67
SCHEMBL21056418 0.67
Iodide SCHEMBL22092570 0.67
SCHEMBL15645745 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119812706-A LTCC band-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2025-04-11 CN claimed
CN-119183251-A 350-2000MHz high-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2024-12-24 CN claimed
CN-119183252-A High-frequency high-rejection low-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2024-12-24 CN claimed
CN-101515496-A Thermal resistor and manufacturing method thereof JIAXU FU (CN) 2009-08-26 CN claimed
CN-120659239-A LTCC substrate manufacturing method 贵阳顺络迅达电子有限公司 2025-09-16 CN disclosed
CN-119812706-A LTCC band-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2025-04-11 CN disclosed
CN-119183252-A High-frequency high-rejection low-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2024-12-24 CN disclosed
CN-119183251-A 350-2000MHz high-pass filter and preparation method thereof 贵阳顺络迅达电子有限公司 2024-12-24 CN disclosed
CN-222226628-U Cathode ball tool for electroplating capacitor 大连达利凯普科技股份公司 2024-12-24 CN disclosed
CN-101515496-A Thermal resistor and manufacturing method thereof JIAXU FU (CN) 2009-08-26 CN disclosed
EP-1663517-A4 METHOD FOR REDUCING LEACHING IN METAL-COATED MEMS PTS CORP (US) 2007-04-04 EP disclosed
EP-1663517-A1 METHOD FOR REDUCING LEACHING IN METAL-COATED MEMS PTS Corporation (US) 2006-06-07 EP disclosed
WO-2005035144-A1 METHOD FOR REDUCING LEACHING IN METAL-COATED MEMS PTS CORPORATION (US) 2005-04-21 WO disclosed