SCHEMBL5145335

SCHEMBL5145335

[Au].[SeH2].[TeH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL5147626 0.87
SCHEMBL2909146 0.82
SCHEMBL9854066 0.82
SCHEMBL5146980 0.82
SCHEMBL400940 0.82
SCHEMBL17749658 0.82
SCHEMBL25318145 0.67
SCHEMBL9052270 0.67
SCHEMBL22581638 0.67
SCHEMBL22551755 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120624834-A Method for recovering gold, selenium and tellurium from gold selenium and tellurium concentrate in gradient manner 江西铜业集团(贵溪)冶化新技术有限公司 2025-09-12 CN disclosed
US-7214476-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
US-7157665-B2 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-7133057-B2 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2006-11-07 US disclosed
US-7083908-B2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2006-08-01 US disclosed
US-20050147931-A1 Process for manufacturing a photothermographic material FUJI PHOTO FILM CO., LTD. 2005-07-07 US disclosed
US-20050074707-A1 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2005-04-07 US disclosed
EP-1519224-A2 Image forming method using photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2005-03-30 EP disclosed
US-20050064348-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. 2005-03-24 US disclosed
EP-1513010-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2005-03-09 EP disclosed
EP-1513011-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2005-03-09 EP disclosed
US-20050048419-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. 2005-03-03 US disclosed
US-20040038161-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-02-26 US disclosed
US-20030224307-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2003-12-04 US disclosed