SCHEMBL5146002

SCHEMBL5146002

C=CCC(CCCCCC)C(=O)O.C=CCC(CCCCCCCCCC)C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 4/20 0.54
GRIK2 Q13002 4/20 0.54
CA2 P00918 2/20 0.52
MAPK1 P28482 1/20 0.52
SLC1A2 P43004 2/20 0.51
SLC1A1 P43005 2/20 0.51
GPR84 Q9NQS5 3/20 0.50
FFAR1 O14842 2/20 0.50
MAPT P10636 1/20 0.48
LCK P06239 1/20 0.48
PPARD Q03181 1/20 0.48
ZDHHC20 Q5W0Z9 1/20 0.48
ZDHHC2 Q9UIJ5 1/20 0.48
FFAR4 Q5NUL3 1/20 0.46
ACE2 Q9BYF1 1/20 0.46
SLC1A3 P43003 1/20 0.44
CPA1 P15085 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1716606 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL7314228 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL3956218 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL5367390 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL2847826 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL4940873 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL5364150 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL1716934 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL3790930 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2
SCHEMBL27429131 1.00 GRIK1 (0.54) GRIK1GRIK2CA2MAPK1SLC1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252924-B2 Positive resist composition and method of pattern formation using the same FUJIFILM CORPORATION (JP) 2007-08-07 US disclosed
US-20040197707-A1 Positive resist composition and method of pattern formation using the same FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed