Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | FAHD1 | Q6P587 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL9324831 | 1.00 | CA4 (0.36) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL5616738 | 0.96 | CA4 (0.38) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL5690375 | 0.92 | CA4 (0.36) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL108536 | 0.88 | — | — | |
| Trifluoroacetic Acid SCHEMBL20571141 | 0.88 | CA4 (0.38) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL2381055 | 0.88 | CA4 (0.38) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL20569660 | 0.88 | CA4 (0.38) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL20569310 | 0.88 | — | — | |
| Trifluoroacetic Acid SCHEMBL20541013 | 0.88 | CA4 (0.38) | CA4CA2CASP1CA1FAHD1 | |
| Trifluoroacetic Acid SCHEMBL282294 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0449969-B1 | PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND | EASTMAN KODAK CO (US) | 1994-02-16 | — | — | EP | claimed |
| EP-0449969-A1 | PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND. | EASTMAN KODAK CO (US) | 1991-10-09 | — | — | EP | claimed |
| US-4968586-A | HIGH SPEED LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 1990-11-06 | — | — | US | claimed |
| WO-1990007730-A1 | PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND | EASTMAN KODAK COMPANY (US) | 1990-07-12 | — | — | WO | claimed |
| JP-54111360-A | — | — | None | — | — | JP | disclosed |
| JP-54121143-A | — | — | None | — | — | JP | disclosed |
| US-10752782-B2 | Radiation curable compositions | AGFA NV (BE) | 2020-08-25 | — | — | US | disclosed |
| US-20200047466-A1 | LAMINATED SAFETY GLASS | AGFA GRAPHICS NV (BE) | 2020-02-13 | — | — | US | disclosed |
| US-10549508-B2 | Laminated safety glass | AGFA NV (BE) | 2020-02-04 | — | — | US | disclosed |
| US-20170355858-A1 | RADIATION CURABLE COMPOSITIONS | AGFA NV (BE) | 2017-12-14 | — | — | US | disclosed |
| US-20160303831-A1 | LAMINATED SAFETY GLASS | AGFA NV (BE) | 2016-10-20 | — | — | US | disclosed |
| EP-2883694-A1 | Laminated Safety Glass | AGFA GRAPHICS NV (BE) | 2015-06-17 | — | — | EP | disclosed |
| US-4296422-A | Image recording material and image recording method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1981-10-20 | — | — | US | disclosed |
| US-4292399-A | Cobalt (III) complex imaging compositions having improved photographic properties | EASTMAN KODAK COMPANY (US) | 1981-09-29 | — | — | US | disclosed |
| US-4273860-A | INCLUDING A PHOTOINHIBITOR TO SUPPRESS DECOMPOSITION OF THE COBALT COMPLEX USING RADIATION OF WAVELENGTHS LONGER THAN 300NM; NEGATIVES AND POSITIVES | EASTMAN KODAK COMPANY (US) | 1981-06-16 | — | — | US | disclosed |
| JP-S54121143-A | ELECTRO-THERMOGRAPHIC MATERIAL | RICOH CO LTD | 1979-09-20 | — | — | JP | disclosed |
| JP-S54111360-A | ELECTROSENSITIVE RECORDING MATERIAL AND RECORDING METHOD FOR THE SAME | RICOH CO LTD | 1979-08-31 | — | — | JP | disclosed |
| EP-0003263-A1 | A method of forming an image, and an imaging element for inhibiting image formation with cobalt (III) complexes | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1979-08-08 | — | — | EP | disclosed |
| WO-1979000448-A1 | INHIBITING IMAGE FORMATION WITH COBALT(III)COMPLEXES | EASTMAN KODAK CO (US) | 1979-07-26 | — | — | WO | disclosed |
| US-4131463-A | Electric recording process of images using electron sensitive layer containing trivalent cobalt complex and compound having conjugated π bond system | FUJI PHOTO FILM CO., LTD. (JP) | 1978-12-26 | — | — | US | disclosed |