Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.63 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.63 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.57 |
| ▸ | TP53 | P04637 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.51 |
| ▸ | RARA | P10276 | 1/20 | 0.51 |
| ▸ | RARB | P10826 | 1/20 | 0.51 |
| ▸ | PTPN11 | Q06124 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.47 |
| ▸ | RNASEL | Q05823 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5157413 | 0.98 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL6938963 | 0.97 | TSHR (0.59) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL6938958 | 0.94 | TSHR (0.58) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| Hydrochloric Acid SCHEMBL6941383 | 0.92 | TSHR (0.57) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL10653835 | 0.90 | TSHR (0.66) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL13737267 | 0.86 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL4138132 | 0.86 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL27261457 | 0.86 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL301822 | 0.86 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL31633208 | 0.86 | TSHR (0.61) | TSHRTDP1L3MBTL1MAPK1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1013650-B1 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | HITACHI CHEM DUPONT MICROSYS (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6329494-B1 | HIGH-SPEED DEVELOPABILITY, HIGH RESOLUTION AND GOOD DIMENSIONAL ACCURACY TO SUIT THEM TO THE PRODUCTION OF INTERLAYER INSULATING FILMS OR SURFACE-PROTECTING FILMS IN SEMICONDUCTOR DEVICES | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |