⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5367184 | 0.83 | — | — | |
| SCHEMBL4137292 | 0.83 | — | — | |
| SCHEMBL661638 | 0.80 | — | — | |
| SCHEMBL28648887 | 0.76 | — | — | |
| SCHEMBL26030 | 0.75 | — | — | |
| SCHEMBL23295170 | 0.72 | — | — | |
| Water SCHEMBL28555745 | 0.72 | — | — | |
| Ammonia Solution, Strong SCHEMBL4994633 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL1844020 | 0.72 | — | — | |
| SCHEMBL984824 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2965904-B1 | MULTILAYER STRUCTURE MANUFACTURING METHOD | FUJIFILM CORP (JP) | 2020-04-22 | — | — | EP | disclosed |
| EP-2965904-A1 | MULTILAYER STRUCTURE, MULTILAYER STRUCTURE MANUFACTURING METHOD AND COMPOSITION SET | FUJIFILM Corporation (JP) | 2016-01-13 | — | — | EP | disclosed |
| EP-2492296-B1 | Resin composition for laser engraving, relief printing plate precursor and process for producing the same, and relief printing plate | FUJIFILM CORP (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-8859669-B2 | Process for producing relief printing plate precursor for laser engraving, relief printing plate precursor for laser engraving, process for making relief printing plate, and relief printing plate | FUJIFILM CORPORATION (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8652760-B2 | Printing plate precursor for laser engraving, printing plate, and method for producing printing plate | FUJIFILM CORPORATION (JP) | 2014-02-18 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| EP-2236290-B1 | Printing plate precursor for laser engraving , printing plate, and method for producing printing plate | FUJIFILM CORP (JP) | 2011-09-07 | — | — | EP | disclosed |
| EP-2236290-A1 | Printing plate precursor for laser engraving , printing plate, and method for producing printing plate | Fujifilm Corporation (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100248139-A1 | PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PRINTING PLATE, AND METHOD FOR PRODUCING PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100243624-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND METHOD FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| WO-2010090345-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | WO | disclosed |
| US-7193026-B2 | Organosilicon compound-curing composition and silicone-base coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20040260048-A1 | Organosilicon compound - curing composition and silicone-base coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| EP-0608888-B1 | To elastomers crosslinkable polyorganosiloxane compositions | WACKER CHEMIE GMBH (DE) | 1999-12-01 | — | — | EP | disclosed |
| US-5371165-A | Crosslinkable nontoxic coating compositions comprising a copolymer of a polysiloxane and an unsaturated monomer, a silicate or silanetriol and a phosphate | WACKER-CHEMIE GMBH (DE) | 1994-12-06 | — | — | US | disclosed |
| EP-0608888-A1 | To elastomers crosslinkable polyorganosiloxane compositions | Wacker-Chemie GmbH (DE) | 1994-08-03 | — | — | EP | disclosed |