⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4404797 | 0.83 | — | — | |
| SCHEMBL18901171 | 0.83 | — | — | |
| SCHEMBL18633404 | 0.81 | — | — | |
| SCHEMBL10080235 | 0.81 | — | — | |
| SCHEMBL6569483 | 0.76 | — | — | |
| SCHEMBL21338216 | 0.76 | — | — | |
| SCHEMBL25918874 | 0.74 | — | — | |
| SCHEMBL23875422 | 0.73 | — | — | |
| SCHEMBL516397 | 0.72 | — | — | |
| SCHEMBL7025745 | 0.67 | CES1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023192701-A1 | MEMBRANES FOR THE SEPARATION OF H2S FROM H2S-CO2 MIXTURES | OHIO STATE INNOVATION FOUNDATION (US) | 2023-10-05 | — | — | WO | claimed |
| CN-113302216-A | Limonene-based (meth) acrylates for 3D printing | 巴斯夫欧洲公司 | 2021-08-24 | — | — | CN | claimed |
| US-20240240041-A1 | RADIATION-CURABLE COMPOSITION TO PRODUCE SUPPORT SUB-STRUCTURE FOR 3D PHOTOPOLYMER JETTING | BASF SE (DE) | 2024-07-18 | — | — | US | disclosed |
| WO-2024012962-A1 | UV-CURABLE COATINGS HAVING HIGH REFRACTIVE INDEX | BASF SE (DE) | 2024-01-18 | — | — | WO | disclosed |
| EP-4288229-A1 | COMPOSITIONS, COMPRISING SILVER NANOPLATELETS | BASF SE (DE) | 2023-12-13 | — | — | EP | disclosed |
| WO-2023192701-A1 | MEMBRANES FOR THE SEPARATION OF H2S FROM H2S-CO2 MIXTURES | OHIO STATE INNOVATION FOUNDATION (US) | 2023-10-05 | — | — | WO | disclosed |
| CN-110520452-B | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | 三菱化学株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-111560180-B | Composition, cured product and article | 荒川化学工业株式会社 | 2022-07-05 | — | — | CN | disclosed |
| CN-112166162-B | Antifouling coating composition | 三菱化学株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-110506064-B | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | 三菱化学株式会社 | 2022-06-03 | — | — | CN | disclosed |
| EP-3911691-A1 | HYDROXYURETHANE (METH)ACRYLATE PREPOLYMERS FOR USE IN 3D PRINTING | BASF SE (DE) | 2021-11-24 | — | — | EP | disclosed |
| US-5530150-A | HAVING PHOSPHINE AND PHOSPHITE GROUPS IN SAME MOLECULE; CATALYST SELECTIVITY | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1996-06-25 | — | — | US | disclosed |
| EP-0684249-A1 | Phosphine compounds, complexes containing the phosphine compounds as ligands, and process for producing optically active aldehydes using the phosphine compounds or complexes | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0684230-A1 | 4- (R)-1'-formylethyl azetidin-2-one derivatives | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| US-5376294-A | A dielectric particle and a polysiloxane/acrylic ester additive in a dielectric dispersant medium; large shear stress and low current density; stability; nonsettling | NIPPON SHOKUBAI CO., LTD. (JP) | 1994-12-27 | — | — | US | disclosed |
| EP-0614870-A2 | Process for producing optically active aldehydes | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0614903-A2 | Phosphine compounds, complexes containing the phosphine compounds as ligands, process for producing optically active aldehydes using the phosphine compounds, or complexes, and 4-[(R)-1' formylethyl]azetidin-2-one derivatives | Takasago International Corporation (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
| US-3953408-A | LITHOGRAPHIC PLATES | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) | 1976-04-27 | — | — | US | disclosed |