SCHEMBL5165683

SCHEMBL5165683

CCS(=O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10810951 0.73
SCHEMBL12183790 0.69
SCHEMBL27521977 0.69
SCHEMBL8872940 0.69
SCHEMBL27315035 0.69
SCHEMBL197870 0.69
SCHEMBL10594882 0.69
SCHEMBL18175386 0.69
SCHEMBL18175288 0.69
SCHEMBL24651301 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106279023-A 3,4,5-tri-substituted pyrazolecarboxylic compounds, preparation method, pharmaceutical composition and purposes 中国科学院上海药物研究所 2017-01-04 CN disclosed
US-9505859-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2016-11-29 US disclosed
EP-2780381-B1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORP (JP) 2015-10-07 EP disclosed
US-20150136700-A1 CHROMATOGRAPHIC MATERIALS WATERS TECHNOLOGIES CORPORATION (US) 2015-05-21 US disclosed
US-20140319057-A1 CHROMATOGRAPHIC MATERIALS FOR THE SEPARATION OF UNSATURATED MOLECULES WATERS TECHNOLOGIES CORPORATION (US) 2014-10-30 US disclosed
US-20140303327-A1 Process For Producing Polydienes BRIDGESTONE CORPORATION (JP) 2014-10-09 US disclosed
EP-2780381-A1 PROCESS FOR PRODUCING POLYDIENES Bridgestone Corporation (JP) 2014-09-24 EP disclosed
US-8546059-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-01 US disclosed
WO-2013075085-A1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORPORATION (JP) 2013-05-23 WO disclosed
US-8426106-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-23 US disclosed
EP-2366699-A1 8-SUBSTITUTED ISOQUINOLINE DERIVATIVE AND USE THEREOF Asahi Kasei Pharma Corporation (JP) 2011-09-21 EP disclosed
US-20110123926-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-26 US disclosed
US-20110111342-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2011-05-12 US disclosed
US-20110091807-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
EP-1768499-A1 MEDICINAL PRODUCTS INCORPORATING BOUND ORGANOSULFUR GROUPS Ott, David M. (US) 2007-04-04 EP disclosed
WO-2005115173-A1 MEDICINAL PRODUCTS INCORPORATING BOUND ORGANOSULFUR GROUPS OTT DAVID M (US) 2005-12-08 WO disclosed
US-6288061-B1 INTERLEUKIN INHIBITORS; ASTHMA, BRONCHODILATOR AGENTS, ANTIALLERGENS WELFIDE CORPORATION (JP) 2001-09-11 US disclosed