SCHEMBL517180

SCHEMBL517180

O=[Zr].[La]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21678776 0.89
SCHEMBL1575679 0.89
SCHEMBL28949008 0.89
SCHEMBL28968632 0.89
SCHEMBL28883760 0.89
SCHEMBL25228773 0.89
SCHEMBL2522502 0.89
SCHEMBL571888 0.89
SCHEMBL11323442 0.87
SCHEMBL15399 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 304 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260112582-A1 STRUCTURAL MEMBER TOTO LTD. (JP) 2026-04-23 US claimed
US-20260112581-A1 STRUCTURAL MEMBER TOTO LTD. (JP) 2026-04-23 US claimed
CN-223951138-U Thermal barrier coating of gas turbine 永能动力(北京)科技有限公司 2026-02-27 CN claimed
WO-2025217325-A1 ELECTROSTATIC CHUCK WITH MULTI-COMPONENT CERAMIC COATING APPLIED TO BASEPLATE LAM RESEARCH CORPORATION (US) 2025-10-16 WO claimed
US-20250246413-A1 COATED PART FOR PLASMA PROCESSING CHAMBER LAM RESEARCH CORPORATION 2025-07-31 US claimed
WO-2025136611-A1 SINTERED LANTHANUM ZIRCONIUM OXIDE, MULTI-LAYER SINTERED CERAMIC BODIES, AND RELATED METHODS HERAEUS COVANTICS NORTH AMERICA LLC (US) 2025-06-26 WO claimed
CN-120157462-A Ceramic capable of naturally forming tortoise cracks and preparation method thereof 宜兴市德艺海紫砂艺术品有限公司 2025-06-17 CN claimed
CN-119710283-A Recovery method of lithium lanthanum zirconium oxygen type solid electrolyte waste 江西赣锋循环科技有限公司 2025-03-28 CN claimed
CN-112088450-B Porous electrode for electrochemical device I-TEN公司 2025-02-07 CN claimed
WO-2024250154-A1 CERAMIC MEMBRANE ELECTROLYTIC BATH FOR EXTRACTING LITHIUM FROM SALT LAKE BY MEANS OF ELECTRICAL DE-INTERCALATION, AND ELECTROLYSIS DEVICE AND METHOD FOR EXTRACTING LITHIUM FROM SALT LAKE BY MEANS OF ELECTRICAL DE-INTERCALATION 广东邦普循环科技有限公司 2024-12-12 WO claimed
CN-109244239-A A kind of zirconium doping Organic Thin Film Transistors and preparation method thereof 华南师范大学 2019-01-18 CN claimed
US-20190019670-A1 APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDUCTOR FILMS IN A SINGLE PROCESSING CHAMBER ASM IP HOLDING B.V. (NL) 2019-01-17 US claimed
CN-108886125-A Segmented battery cell architecture for solid state batteries 密执安州立大学董事会 2018-11-23 CN claimed
US-20180205112-A1 SOLID ELECTROLYTE FOR A NEGATIVE ELECTRODE OF A SECONDARY BATTERY AND METHODS FOR THE MANUFACTURE OF AN ELECTROCHEMICAL CELL CORNING INCORPORATED 2018-07-19 US claimed
US-8852803-B2 Composite, electrode active material for secondary lithium battery including the composite, method of preparing the composite, anode for secondary lithium battery including the electrode active material, and secondary lithium battery including the anode SAMSUNG SDI CO., LTD. (KR) 2014-10-07 US claimed
US-20120251882-A1 COMPOSITE, ELECTRODE ACTIVE MATERIAL FOR SECONDARY LITHIUM BATTERY INCLUDING THE COMPOSITE, METHOD OF PREPARING THE COMPOSITE, ANODE FOR SECONDARY LITHIUM BATTERY INCLUDING THE ELECTRODE ACTIVE MATERIAL, AND SECONDARY LITHIUM BATTERY INCLUDING THE ANODE SAMSUNG SDI CO., LTD. (KR) 2012-10-04 US claimed
EP-2145679-A1 Multifunctional Catalyst for Diesel Exhaust Gas Cleaning Applications and Method of its Preparation Ford Global Technologies, LLC, A subsidary of Ford Motor Company (US) 2010-01-20 EP claimed
CN-101628235-A Multifunctional catalyst for diesel exhaust gas cleaning applications and manufacture method thereof FORD GLOBAL TECH LLC 2010-01-20 CN claimed
US-7193294-B2 Semiconductor substrate comprising a support substrate which comprises a gettering site TOSHIBA CERAMICS CO., LTD. (JP) 2007-03-20 US claimed
US-20060118868-A1 A semiconductor substrate comprising a support substrate which comprises a gettering site TOSHIBA CERAMICS CO., LTD. 2006-06-08 US claimed