⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28212635 | 0.89 | — | — | |
| Hydrogen Sulfide SCHEMBL28273184 | 0.89 | — | — | |
| Water SCHEMBL4029249 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL11261565 | 0.89 | — | — | |
| Iodide SCHEMBL27075141 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL2019243 | 0.89 | — | — | |
| SCHEMBL8008211 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL1357155 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL6699113 | 0.89 | — | — | |
| Ethylene SCHEMBL17701178 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3510 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12428727-B2 | Cyclic film deposition using reductant gas | TOKYO ELECTRON LIMITED (JP) | 2025-09-30 | — | — | US | claimed |
| US-20250081588-A1 | METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | ASM IP HOLDING B.V. (NL) | 2025-03-06 | — | — | US | claimed |
| WO-2025049700-A1 | COMPOSITIONS AND METHODS FOR NUCLEIC ACID SEQUENCING | ILLUMINA, INC. (US) | 2025-03-06 | — | — | WO | claimed |
| CN-119465067-A | Method for depositing a molybdenum metal film on a dielectric surface of a substrate by a cyclical deposition process and associated semiconductor device structure | ASM IP控股有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119301299-A | Cyclic film deposition using reducing agent gas | 东京毅力科创株式会社 | 2025-01-10 | — | — | CN | claimed |
| US-12166099-B2 | Methods for forming a semiconductor device structure and related semiconductor device structures | ASM IP HOLDING B.V. (NL) | 2024-12-10 | — | — | US | claimed |
| US-20240363334-A1 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS | Kokusai Electric Corporation (JP) | 2024-10-31 | — | — | US | claimed |
| CN-116196903-B | Aqueous phase radioactive anion adsorbent based on anion-pi action | 中南大学 | 2024-10-18 | — | — | CN | claimed |
| US-12077653-B2 | Build materials for photochemical additive manufacturing applications | UNIVERSITY OF SOUTH ALABAMA (US) | 2024-09-03 | — | — | US | claimed |
| CN-117205718-B | Capturing and fixing CO2Composite material of (2), preparation method and CO2Absorption device | 青岛理工大学 | 2024-05-14 | — | — | CN | claimed |
| US-4417021-A | POLYAMIDES, POLYHYDRAZIDES AS NUCLEATION AGENTS, MOLDING | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1983-11-22 | — | — | US | claimed |
| US-4374135-A | AMIDINO HYDRAZONE COMPOUNDS | AMERICAN CYANAMID COMPANY (US) | 1983-02-15 | — | — | US | claimed |
| US-4353962-A | USING AN ACRYLIC POLYMER | ENVIRONMENTAL CHEMICALS, INC. (US) | 1982-10-12 | — | — | US | claimed |
| US-4338426-A | Intermediate, copolymer resin and production thereof | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1982-07-06 | — | — | US | claimed |
| EP-0039155-A1 | Polyester molding composition, production thereof and molded articles produced therefrom | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1981-11-04 | — | — | EP | claimed |
| US-4225485-A | Chemiluminescent naphthalene-1,2-dicarboxylic acid hydrazide-labeled polypeptides and proteins | MILES LABORATORIES, INC. (US) | 1980-09-30 | — | — | US | claimed |
| US-4225702-A | Method of preparing polyamide acid type intermediates for processing of semiconductors | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1980-09-30 | — | — | US | claimed |
| US-4109094-A | EXHAUSTIVE; REPETATIVE NEUTRALIZATION | ASHLAND OIL, INC. (US) | 1978-08-22 | — | — | US | claimed |
| US-4082708-A | POT LIFE, EPOXY RESIN CURING AGENTS | H. B. FULLER COMPANY (US) | 1978-04-04 | — | — | US | claimed |
| US-4040083-A | ALUMINUM OXIDE LAYER BONDING POLYMER RESIN LAYER TO SEMICONDUCTOR DEVICE | HITACHI, LTD. (JA) | 1977-08-02 | — | — | US | claimed |