⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15191892 | 0.87 | TSHR (0.30) | — | |
| SCHEMBL16143279 | 0.86 | TSHR (0.31) | — | |
| SCHEMBL5324146 | 0.78 | TSHR (0.35) | — | |
| SCHEMBL28522204 | 0.78 | TSHR (0.38) | — | |
| SCHEMBL8075836 | 0.76 | — | — | |
| SCHEMBL28479761 | 0.75 | TSHR (0.33) | — | |
| SCHEMBL27998278 | 0.71 | APEX1 (0.30) | — | |
| SCHEMBL11698657 | 0.71 | TYMP (0.30) | — | |
| SCHEMBL27572663 | 0.70 | TSHR (0.33) | — | |
| SCHEMBL2137225 | 0.70 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-58087117-A | — | — | None | — | — | JP | disclosed |
| EP-1577090-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2007-06-06 | — | — | EP | disclosed |
| US-20050208423-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| EP-1577090-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-21 | — | — | EP | disclosed |
| EP-0633618-B1 | LITHIUM SECONDARY CELL | TDK CORP (JP) | 2000-03-22 | — | — | EP | disclosed |
| EP-0662728-B1 | Lithium secondary cell | TDK CORP (JP) | 1998-04-29 | — | — | EP | disclosed |
| US-5589297-A | POWER SUPPLIES FOR DRIVING PORTABLE ELECTRONIC APPLIANCES | TDK CORPORATION (JP) | 1996-12-31 | — | — | US | disclosed |
| US-5565284-A | STABILITY DURING CHARGING, DISCHARGING CYCLES | TDK CORPORATION (JP) | 1996-10-15 | — | — | US | disclosed |
| EP-0662728-A1 | Lithium secondary cell | TDK Corporation (JP) | 1995-07-12 | — | — | EP | disclosed |
| EP-0633618-A1 | LITHIUM SECONDARY CELL | TDK Corporation (JP) | 1995-01-11 | — | — | EP | disclosed |
| EP-0348063-B1 | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-5053316-A | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0348063-A1 | Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1989-12-27 | — | — | EP | disclosed |
| US-4855334-A | ISOCYANURIC RING CONTAINING POLYMER; PROTECTIVE COATINGS | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1989-08-08 | — | — | US | disclosed |
| EP-0132451-B1 | CURABLE RESIN COMPOSITION AND ITS USE | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-06-10 | — | — | EP | disclosed |
| EP-0132451-A1 | Curable resin composition and its use | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1985-02-13 | — | — | EP | disclosed |
| JP-S5887117-A | CURABLE RESIN COMPOSITION | DAINIPPON INK & CHEM INC | 1983-05-24 | — | — | JP | disclosed |