⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2264148 | 1.00 | — | — | |
| SCHEMBL17055587 | 0.68 | — | — | |
| SCHEMBL1306210 | 0.68 | — | — | |
| SCHEMBL18290883 | 0.68 | — | — | |
| SCHEMBL20768170 | 0.68 | — | — | |
| SCHEMBL20768171 | 0.68 | — | — | |
| SCHEMBL38267 | 0.67 | — | — | |
| SCHEMBL150696 | 0.63 | — | — | |
| SCHEMBL1866728 | 0.63 | — | — | |
| SCHEMBL20768174 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116705595-A | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2023-09-05 | — | — | CN | claimed |
| EP-4591122-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | Lam Research Corporation (US) | 2025-07-30 | — | — | EP | disclosed |
| US-20240255850-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RES CORP (US) | 2024-08-01 | — | — | US | disclosed |
| WO-2024064071-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2024-03-28 | — | — | WO | disclosed |
| US-20230360922-A1 | ROBUST ASHABLE HARD MASK | LAM RESEARCH CORPORATION | 2023-11-09 | — | — | US | disclosed |
| CN-116705595-A | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-113574456-B | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2023-05-26 | — | — | CN | disclosed |
| CN-115735262-A | Robust ashable hard mask | 朗姆研究公司 | 2023-03-03 | — | — | CN | disclosed |
| CN-114200776-A | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2022-03-18 | — | — | CN | disclosed |
| EP-1988764-B2 | SCREENING METHOD FOR SELECTING PLANTS THAT SHOW A REDUCED WOUND-INDUCED SURFACE DISCOLOURATION | RIJK ZWAAN ZAADTEELT EN ZAADHANDEL BV (NL) | 2016-11-16 | — | — | EP | disclosed |
| WO-2011109587-A1 | SUBSTITUTED AZA-BICYCLIC IMIDAZOLE DERIVATIVES USEFUL AS TRPM8 RECEPTOR MODULATORS | JANSSEN PHARMACEUTICA NV (BE) | 2011-09-09 | — | — | WO | disclosed |
| US-7360588-B2 | Thermal processes for subsurface formations | SHELL OIL COMPANY (US) | 2008-04-22 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1099719-B1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR CORP (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20050003218-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2005-01-06 | — | — | US | disclosed |
| US-6528605-B1 | Diyne-containing (co)polymer, processes for producing the same, and cured film | JSR CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| EP-1099719-A1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |