⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL137893 | 0.71 | — | — | |
| SCHEMBL139151 | 0.66 | CA1 (0.39) | — | |
| SCHEMBL137862 | 0.63 | — | — | |
| SCHEMBL16687569 | 0.63 | CA9 (0.42) | — | |
| SCHEMBL3219257 | 0.62 | TSHR (0.44) | — | |
| Potassium SCHEMBL31228960 | 0.60 | TSHR (0.42) | — | |
| SCHEMBL31229120 | 0.60 | TSHR (0.42) | — | |
| Cyclohexane SCHEMBL10738519 | 0.59 | TSHR (0.33) | — | |
| SCHEMBL239146 | 0.59 | — | — | |
| SCHEMBL18287699 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070131558-A1 | PROCESS FOR DEPOSITION OF CRACK-FREE AND CORROSION-RESISTANT HARD CHROMIUM AND CHROMIUM ALLOY LAYERS | ENTHONE INC. (US) | 2007-06-14 | — | — | US | claimed |
| US-9012095-B2 | Electrolyte and secondary battery | SONY CORPORATION (JP) | 2015-04-21 | — | — | US | disclosed |
| US-8980483-B2 | Electrolyte and secondary battery | SONY CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20110193068-A1 | Composite film, flexible substrate including the composite film, and organic light emitting device including the flexible substrate | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-08-11 | — | — | US | disclosed |
| US-20110193068-A1 | Composite film, flexible substrate including the composite film, and organic light emitting device including the flexible substrate | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-08-11 | — | — | US | disclosed |
| US-7842199-B2 | Proton conducting titanate, polymer nano-composite membrane including the same, and fuel cell adopting the polymer nano-composite membrane | SAMSUNG SDI CO., LTD. (KR) | 2010-11-30 | — | — | US | disclosed |
| US-20100190065-A1 | ELECTROLYTE AND SECONDARY BATTERY | SONY CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100178569-A1 | ELECTROLYTE AND SECONDARY BATTERY | SONY CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20080286648-A1 | contains solvent and a sulfone compound; improved chemical stability of the electrolytic solution; nondegrading; improved cycle characteristics and the storage characteristics | SONY CORPORATION (JP) | 2008-11-20 | — | — | US | disclosed |
| EP-1798313-A2 | Process for depositing crack-free, corrosion resistant and hard chromium and chromium alloy layers | Enthone, Inc. (US) | 2007-06-20 | — | — | EP | disclosed |
| US-20070131558-A1 | PROCESS FOR DEPOSITION OF CRACK-FREE AND CORROSION-RESISTANT HARD CHROMIUM AND CHROMIUM ALLOY LAYERS | ENTHONE INC. (US) | 2007-06-14 | — | — | US | disclosed |
| US-20070053826-A1 | Proton conducting titanate, polymer nano-composite membrane including the same, and fuel cell adopting the polymer nano-composite membrane | SAMSUNG SDI CO., LTD. (KR) | 2007-03-08 | — | — | US | disclosed |
| US-5238777-A | Resin containing light sensitive azide groups, further reacted with anhydride material to generate carboxylic and sulfonic acid groups; lithography | DUPONT (U.K.) LIMITED (GB) | 1993-08-24 | — | — | US | disclosed |
| EP-0247457-B1 | PROCESS FOR THE PREPARATION OF REAGENT LAYERS CONTAINING HYDROPHOBIC REAGENTS | MILES INC. (US) | 1993-04-07 | — | — | EP | disclosed |
| EP-0412731-A1 | Improvements in or relating to bakeable aqueous photopolymers | Du Pont (UK) Limited (GB) | 1991-02-13 | — | — | EP | disclosed |
| US-4840885-A | DYE-RELEASING COMPOUNDS USED IN FORM OF PARTICLES OF IONICALLY-MODIFIED POLYMERS; ANTIFOGGING AGENTS; PHOTOTHERMOGRAPHY | AGFA-GEVAERT AKTIENGESSELLSCHAFT (DE) | 1989-06-20 | — | — | US | disclosed |
| EP-0247457-A2 | Process for the preparation of reagent layers containing hydrophobic reagents | MILES INC. (US) | 1987-12-02 | — | — | EP | disclosed |