SCHEMBL5189686

SCHEMBL5189686

COC(CCC1CCC2OC2C1)(CO[SiH3])OC

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.34
PTGS2 P35354 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4806595 0.86 PTGS1 (0.33) PTGS1PTGS2
SCHEMBL4806796 0.83 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL28311431 0.81 PTGS1 (0.35) PTGS1PTGS2
SCHEMBL3056316 0.79
SCHEMBL1665119 0.78 PTGS1 (0.34) PTGS1PTGS2
SCHEMBL612718 0.75 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL12098604 0.74
SCHEMBL18815426 0.74 PTGS1 (0.31) PTGS1PTGS2
SCHEMBL5397558 0.73 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL4807213 0.73 PTGS1 (0.33) PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0554101-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-04 EP claimed
EP-1549700-B1 LAYER SYSTEM AND METHOD FOR PRODUCING THE SAME BAYER MATERIALSCIENCE AG (DE) 2007-08-01 EP disclosed
US-7250219-B2 Hardness, optical transparency BAYER MATERIALSCIENCE AG (DE) 2007-07-31 US disclosed
EP-1549700-A1 LAYER SYSTEM AND METHOD FOR PRODUCING THE SAME Bayer MaterialScience AG (DE) 2005-07-06 EP disclosed
US-20040110012-A1 Coating composition and a process for its preparation BAYER AKTIENGESELLSCHAFT (DE) 2004-06-10 US disclosed
WO-2004031273-A1 LAYER SYSTEM AND METHOD FOR PRODUCING THE SAME BAYER MATERIALSCIENCE AG (DE) 2004-04-15 WO disclosed
EP-0554101-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-04 EP disclosed