SCHEMBL5199724

SCHEMBL5199724

Clc1cc2cccc3ccc4cccc1c4c32

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.57
ERBB2 P04626 1/20 0.57
FYN P06241 1/20 0.57
MAOA P21397 1/20 0.57
ACHE P22303 1/20 0.57
AHR P35869 1/20 0.57
ALDH1A1 P00352 4/20 0.52
HPGD P15428 3/20 0.52
HSD17B10 Q99714 3/20 0.52
THRB P10828 1/20 0.52
CYP3A4 P08684 2/20 0.50
TSHR P16473 2/20 0.50
CYP1A1 P04798 2/20 0.50
CYP1B1 Q16678 2/20 0.50
L3MBTL1 Q9Y468 3/20 0.45
TDP1 Q9NUW8 2/20 0.45
CYP2A6 P11509 3/20 0.44
CCR1 P32246 1/20 0.42
CCR8 P51685 1/20 0.42
MEN1 O00255 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27925725 0.98 CYP1A2 (0.55) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL27883847 0.87 CYP1A2 (0.48) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL11767590 0.84 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL3657999 0.83 CYP1A2 (0.53) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL4892176 0.82 CYP1A2 (0.44) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL176331 0.81 CYP1A2 (0.55) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL29360179 0.81 CYP1A2 (0.55) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL28631866 0.81 CYP1A2 (0.43) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL31435884 0.79 CYP1A2 (0.50) CYP1A2ERBB2FYNMAOAACHE
Hydrochloric Acid SCHEMBL27847735 0.79 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108503903-A Natural rubber-chloroprene rubber composition material, preparation method and application 江苏骆氏减震件有限公司 2018-09-07 CN claimed
CN-221316629-U Luminous diving suit 珠海海阳潜水服务有限公司 2024-07-12 CN disclosed
CN-219832264-U Fire-proof deflection-resistant symmetrical communication cable for ship 浙江元通线缆制造有限公司 2023-10-13 CN disclosed
CN-219476377-U Torsion-resistant aluminum alloy core aluminum stranded wire electric welding machine cable 浙江元通线缆制造有限公司 2023-08-04 CN disclosed
CN-116525187-A Fire-resistant marine symmetrical single-sheath 9-core communication cable 浙江中大元通电缆科技有限公司 2023-08-01 CN disclosed
CN-115787486-A Construction method for prefabricating UHPC formwork core filling concrete pier 郑州大学 2023-03-14 CN disclosed
CN-217351539-U Point welding type anode structure for protecting deepwater sea pipe 海洋石油工程股份有限公司 2022-09-02 CN disclosed
CN-217239093-U Cable for charging drag-resistant electric automobile 浙江中大元通电缆科技有限公司 2022-08-19 CN disclosed
CN-216999097-U Quick mounting and dismounting structure for track of assembled subway shield machine 中交二公局第四工程有限公司 2022-07-19 CN disclosed
CN-216596983-U Soft low-attenuation multi-core cable 浙江中大元通电缆研究有限公司 2022-05-24 CN disclosed
US-6811964-B2 MIXING A SILVER HALIDE PARTICLE FEEDING SOLUTION IN A MOTHER LIQUID OF COATING LIQUID. FUJI PHOTO FILM CO., LTD. (JP) 2004-11-02 US disclosed
US-20040202790-A1 Method and apparatus for producing photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2004-10-14 US disclosed
US-20040191705-A1 METHOD AND APPARATUS FOR PRODUCING COATING LIQUID FOR PHOTOTHERMOGRAPHIC MATERIAL FUJIFILM CORPORATION (JP) 2004-09-30 US disclosed
US-6714296-B2 Method and apparatus for inspecting photosensitive material for surface defects FUJI PHOTO FILM. CO., LTD. (JP) 2004-03-30 US disclosed
US-6586171-B1 Cured to some extent by the gelation of the coating film in the chilling-zone process and the first- stage drying in the PAC drying process, then, it is fully dried by the second-stage drying in the HAC drying process, liquid FUJI PHOTO FILM CO., LTD. (JP) 2003-07-01 US disclosed
US-20030090653-A1 Method and apparatus for inspecting photosensitive material for surface defects FUJI PHOTO FILM CO., LTD. (JP) 2003-05-15 US disclosed
US-20030073046-A1 Method of producing thermal-developable photosensitive material FUJI PHOTO FILM,CO., LTD. (JP) 2003-04-17 US disclosed
EP-1300725-A2 Method of producing thermal-developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2003-04-09 EP disclosed
CN-1005981-B Elastomer composition and process for producing the same 尤尼罗亚尔化学公司 1989-12-06 CN disclosed
CN-86108468-A Elastic composition and production method thereof UNIROYAL CHEM CO INC (US) 1987-09-09 CN disclosed