SCHEMBL522779

SCHEMBL522779

O=C(CF)CC(=O)c1ccccc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.67
TDP1 Q9NUW8 3/20 0.67
MEN1 O00255 2/20 0.67
CYP3A4 P08684 2/20 0.67
HPGD P15428 2/20 0.67
MAPK1 P28482 2/20 0.67
MAPT P10636 2/20 0.67
KDM4E B2RXH2 1/20 0.67
ALOX15 P16050 1/20 0.67
CES1 P23141 1/20 0.67
SMN1; SMN2 Q16637 1/20 0.67
PTPN1 P18031 2/20 0.57
ERCC5 P28715 2/20 0.57
FEN1 P39748 2/20 0.57
NPC1 O15118 4/20 0.53
RAB9A P51151 4/20 0.53
ALDH1A1 P00352 3/20 0.53
HIF1A Q16665 2/20 0.53
PLOD2 O00469 2/20 0.53
CYP2C19 P33261 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1977011 0.86 KMT2A (0.80) KMT2ATDP1MEN1CYP3A4HPGD
SCHEMBL10888944 0.84 KMT2A (0.76) KMT2ATDP1MEN1CYP3A4HPGD
SCHEMBL157987 0.81 TDP1 (0.64) KMT2ATDP1MEN1CYP3A4HPGD
SCHEMBL27980420 0.81 TDP1 (0.64) KMT2ATDP1MEN1CYP3A4HPGD
Dibenzoylmethane SCHEMBL1704711 0.81 MEN1 (1.00) KMT2ATDP1MEN1CYP3A4HPGD
Dibenzoylmethane SCHEMBL10356288 0.81 MEN1 (1.00) KMT2ATDP1MEN1CYP3A4HPGD
Dibenzoylmethane SCHEMBL39582 0.81 MEN1 (1.00) KMT2ATDP1MEN1CYP3A4HPGD
SCHEMBL6120813 0.80 KMT2A (0.70) KMT2ATDP1MEN1CYP3A4HPGD
SCHEMBL2322398 0.80 KMT2A (0.70) KMT2ATDP1MEN1CYP3A4HPGD
Hydrochloric Acid SCHEMBL7418291 0.79 TDP1 (0.61) KMT2ATDP1MEN1CYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-59092916-A None JP disclosed
CN-109180722-A Stable metallic compound, their compositions and their application method AZ电子材料卢森堡有限公司 2019-01-11 CN disclosed
CN-104781262-B Stabilized metal compounds, their compositions, and methods of their use AZ电子材料卢森堡有限公司 2018-11-13 CN disclosed
US-20130236655-A1 PHOTO-SENSITIVE ELECTROMAGNETIC-WAVE INTERCEPTION INK COMPOSITION, ELECTROMAGNETIC-WAVE INTERCEPTION CURED MATERIAL, AND MANUFACTURING METHOD OF ELECTROMAGNETIC-WAVE INTERCEPTION CURED MATERIAL PANASONIC CORPORATION (JP) 2013-09-12 US disclosed
US-20120028075-A1 THIN FILM MANUFACTURING METHOD AND THIN-FILM ELEMENT RICOH COMPANY, LIMITED (JP) 2012-02-02 US disclosed
EP-2357264-A2 Thin film manufacturing method and thin film element Ricoh Company, Ltd. (JP) 2011-08-17 EP disclosed
US-7990228-B2 Semiconductor device and wiring part thereof HITACHI, LTD. (JP) 2011-08-02 US disclosed
US-20110123728-A1 THIN FILM MANUFACTURING METHOD AND THIN FILM ELEMENT RICOH COMPANY, LTD. (JP) 2011-05-26 US disclosed
US-20080266031-A1 SEMICONDUCTOR DEVICE AND WIRING PART THEREOF HITACHI LTD. AND ELPIDA MEMORY, INC. 2008-10-30 US disclosed
US-20020083863-A1 Metal complex solution, photosensitive metal complex solution and method for forming metallic oxide films DAI NIPPON PRINTING CO., LTD 2002-07-04 US disclosed
US-6387012-B1 A METAL COMPLEX SOLUTION COMPRISING AN ORGANIC SOLVENT, AND A COMPLEX COMPOSED OF AN ORGANIC ACID SALT OF AT LEAST ONE METAL AND AN ORGANIC AMINE OR ORGANIC KETONE COMPOUND, DISSOLVED IN THE ORGANIC SOLVENT DAI NIPPON PRINTING CO., LTD. (JP) 2002-05-14 US disclosed
US-5118349-A Security markings, material provided with security marks, and apparatus to detect the security mark PETREL (FR) 1992-06-02 US disclosed
US-4921534-A Security markings, material provided with security marks, and apparatus to detect the security mark PETREL (FR) 1990-05-01 US disclosed
US-4891505-A Security markings, material provided with security marks, and apparatus to detect the security mark PETREL (FR) 1990-01-02 US disclosed
US-4833311-A Security markings, material provided with security marks, and apparatus to detect the security mark PETREL (FR) 1989-05-23 US disclosed
JP-S5992916-A COMPOSITION FOR FORMING TRANSPARENT OXIDE FILM OF IV A-GROUP METAL MITSUBISHI METAL CORP 1984-05-29 JP disclosed