SCHEMBL524296

SCHEMBL524296

O=C(CCC(=O)Sc1nc2ccccc2s1)Sc1nc2ccccc2s1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.62
RECQL P46063 2/20 0.62
APEX1 P27695 1/20 0.62
ALDH1A1 P00352 2/20 0.61
HPGD P15428 2/20 0.61
HSD17B10 Q99714 2/20 0.61
MAPK1 P28482 2/20 0.61
SMN1; SMN2 Q16637 2/20 0.61
TSHR P16473 1/20 0.61
MAPT P10636 1/20 0.59
ADRA2A P08913 1/20 0.58
FBP1 P09467 1/20 0.58
ADORA3 P0DMS8 1/20 0.58
DRD2 P14416 1/20 0.58
ALOX15 P16050 1/20 0.58
ADRA2B P18089 1/20 0.58
ADRA2C P18825 1/20 0.58
DRD1 P21728 1/20 0.58
MC5R P33032 1/20 0.58
OPRM1 P35372 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11145602 0.95 POLB (0.60) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL3098198 0.94 SMN1; SMN2 (0.68) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL4586794 0.89 HTT (0.53) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL10762407 0.88 MAPT (0.55) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL10759431 0.87 MAPT (0.60) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL29015044 0.87 MAPT (0.53) POLBRECQLAPEX1ALDH1A1HPGD
Methylamine SCHEMBL10761344 0.87 MAPT (0.54) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL10758280 0.87 POLB (0.52) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL10761735 0.85 MAPT (0.56) POLBRECQLAPEX1ALDH1A1HPGD
SCHEMBL10762029 0.85 MAPT (0.56) POLBRECQLAPEX1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 214 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11400693-B2 Weather resistance improver, resin composition for coating metal-nanowire layer, and metal nanowire-containing laminate SEIKO PMC CORPORATION (JP) 2022-08-02 US claimed
CN-113337204-B Antifriction paint 米巴滑动轴承奥地利有限公司 2022-06-28 CN claimed
CN-110072949-B Weather resistance improver, resin composition for coating metal nanowire layer, and metal-nanowire-containing laminate 星光PMC株式会社 2021-05-14 CN claimed
CN-109153863-B Weather resistance improver, resin composition for covering metal-containing nanowire layer containing same, and metal-containing nanowire laminate 星光PMC株式会社 2021-03-23 CN claimed
US-20160244637-A1 Chromium-Free Water Based Coating for Treating a Galvannealed or Galvanized Steel Surface TATA STEEL LIMITED (IN) 2016-08-25 US claimed
WO-2015049696-A1 A CHROMIUM-FREE WATER BASED COATING FOR TREATING A GALVANNEALED OR GALVANIZED STEEL SURFACE TATA STEEL LIMITED (IN) 2015-04-09 WO claimed
JP-4147320-B2 2008-09-10 JP claimed
US-7422649-B2 Method for recording information in luminescent compositions and uses thereof in articles of manufacture AMERICAN DYE SOURCE, INC. (CA) 2008-09-09 US claimed
EP-1704048-A4 CHROMATE FREE CORROSION RESISTANT COATING HI SHEAR CORP (US) 2008-07-30 EP claimed
EP-1704048-A2 CHROMATE FREE CORROSION RESISTANT COATING Hi-Shear Corporation (US) 2006-09-27 EP claimed
EP-0944708-A4 NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES OLIN MICROELECTRONIC CHEM INC (US) 2001-09-19 EP claimed
US-6245155-B1 CLEANING COMPOSITION COMPRISES WATER, HYDROXYLAMMONIUM COMPOUND, AT LEAST ONE BASIC AMINE OR QUATERNARY AMMONIUM HYDROXIDE, AND OPTIONALLY A CHELATING STABILIZER, AND A SURFACTANT. ARCH SPECIALTY CHEMICALS, INC. 2001-06-12 US claimed
JP-2001501649-A 2001-02-06 JP claimed
EP-1070157-A1 METHOD FOR REMOVING PHOTORESIST AND PLASMA ETCH RESIDUES Arch Specialty Chemicals, Inc. (US) 2001-01-24 EP claimed
US-6059867-A SYNERGISTIC MIXTURES PRC-DESOTO INTERNATIONAL, INC. (US) 2000-05-09 US claimed
WO-1999051796-A1 METHOD FOR REMOVING PHOTORESIST AND PLASMA ETCH RESIDUES OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-10-14 WO claimed
EP-0944708-A1 NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES Olin Microelectronic Chemicals, Inc. (US) 1999-09-29 EP claimed
US-5951747-A PROTECTIVE COATINGS MIXTURE CONSISTING OF PHOSPHATES, PHOSPHOSILICATES, SILICATES, BORIC ACID, AND/OR (2-BENZOTHIAZOLYLTHIO)SUCCINIC ACID OR AMINE SALTS THEREOF, SODIUM TITANATE, ZINC PHOSPHATE, ZINC CYANAMIDE COURTAULDS AEROSPACE (US) 1999-09-14 US claimed
WO-1998010050-A1 NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1998-03-12 WO claimed
US-5433773-A Adhesion and corrosion resistance using benzothiazoylthio succinic acid and morpholine FREMONT INDUSTRIES, INC. (US) 1995-07-18 US claimed