Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL5867869 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL234816 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL11858088 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL536985 | 1.00 | — | — | |
| Acetic Acid SCHEMBL11857925 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL226015 | 1.00 | — | — | |
| Acetic Acid SCHEMBL4124082 | 1.00 | — | — | |
| Acetic Acid SCHEMBL51762 | 1.00 | — | — | |
| Acetic Acid SCHEMBL5573359 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL11776704 | 1.00 | FFAR3 (0.88) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 13352 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117820509-B | Novel glycoside compounds of semen momordicae, preparation and application thereof | SHANGHAI JIAO TONG UNIVERSITY (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-116121832-B | Polystyrene microsphere/chitosan composite membrane coated with hydrophobic substance and electrodeposition preparation method thereof | WUHAN UNIVERSITY OF TECHNOLOGY (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-120922955-B | Preparation method and application of wood-based solar interface evaporator | ZHEJIANG UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122079449-A | High-flocculation-strength sludge dewatering flocculant, preparation method thereof and application thereof in sludge treatment | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080658-A | Reclaimed rubber powder modified asphalt based on renewable composite activator and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122079938-A | Method for synthesizing FDCA (FDCA) by catalyzing furfuryl alcohol carbonylation with rhodium and iodide ligand in synergistic manner | — | 2026-05-26 | — | — | CN | claimed |
| CN-122076412-A | Preparation method of directional pore canal integral material and method for constructing enrichment device and establishing rapid enrichment method of phosphopeptide | — | 2026-05-26 | — | — | CN | claimed |
| CN-122084520-A | Quick-mounting acetic acid water-containing analyzer | — | 2026-05-26 | — | — | CN | claimed |
| CN-120737293-B | High-water-resistance glyoxal-based copolymer resin for wood bonding and preparation method thereof | SOUTHWEST FORESTRY UNIVERSITY (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122074553-A | Process for cutting goat milk into small molecules by aseptic high-pressure high-speed rotation | — | 2026-05-26 | — | — | CN | claimed |
| EP-0220645-B1 | PHOTOSENSITIVE POSITIVE COMPOSITION AND PHOTORESIST MATERIAL PREPARED THEREWITH | HOECHST CELANESE CORPORATION (US) | 1990-09-12 | — | — | EP | claimed |
| US-4885232-A | High temperature post exposure baking treatment for positive photoresist compositions | HOECHST CELANESE CORPORATION (US) | 1989-12-05 | — | — | US | claimed |
| EP-0221428-B1 | LIQUID FOR THE TREATMENT OF A PHOTORESIST COMPOSITION, AND PROCESS THEREFOR | HOECHST CELANESE CORPORATION (US) | 1989-11-23 | — | — | EP | claimed |
| EP-0164620-B1 | POSITIVELY ACTING LIGHT-SENSITIVE COATING SOLUTION | HOECHST CELANESE CORPORATION (US) | 1989-10-25 | — | — | EP | claimed |
| US-4855214-A | Radiation-sensitive high-polymeric material | SANYO ELECTRIC CO., LTD. (JP) | 1989-08-08 | — | — | US | claimed |
| US-4839231-A | CONTAINING AT LEAST A MONOMOLECULAR LAYER OF A VINYLPYRIDINE POLYMER | PLANT GENETIC SYSTEMS N.V. (BE) | 1989-06-13 | — | — | US | claimed |
| US-4806458-A | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate | HOECHST CELANESE CORPORATION (US) | 1989-02-21 | — | — | US | claimed |
| US-4692398-A | Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate | AMERICAN HOECHST CORPORATION (US) | 1987-09-08 | — | — | US | claimed |
| US-4244881-A | Process for preparing alpha-naphthol esters of aliphatic carboxylic acids | MONTEDISON S.P.A. (IT) | 1981-01-13 | — | — | US | claimed |
| EP-0004390-A1 | Process for preparing alpha-naphthol esters of carboxylic acids | Montedison S.p.A. (IT) | 1979-10-03 | — | — | EP | claimed |