SCHEMBL526106

SCHEMBL526106

C=CCN(CCN)CCC[Si](OC)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL1746226 0.98 KDM4E (0.30) KDM4EALDH1A1TDP1
SCHEMBL21357709 0.91 KDM4E (0.34) KDM4EALDH1A1TDP1
SCHEMBL250917 0.88 KDM4E (0.37) KDM4EALDH1A1TDP1
SCHEMBL8405711 0.85
SCHEMBL1155834 0.84
SCHEMBL337730 0.84 LCK (0.38)
SCHEMBL291935 0.84 LCK (0.38)
SCHEMBL24177734 0.81
SCHEMBL12190565 0.80 LCK (0.35)
SCHEMBL5685342 0.80 KDM4E (0.30) KDM4EALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2279226-B1 SURFACE MODIFIED SILICON DIOXIDE PARTICLES EVONIK DEGUSSA GMBH (DE) 2017-08-09 EP claimed
US-9388314-B2 Surface modified silicon dioxide particles EVONIK HANSE GMBH (DE) 2016-07-12 US claimed
EP-2569362-A1 INSULATION FOR ROTATING ELECTRICAL MACHINES Siemens Aktiengesellschaft (DE) 2013-03-20 EP claimed
WO-2012013439-A1 INSULATION FOR ROTATING ELECTRICAL MACHINES SIEMENS AKTIENGESELLSCHAFT (DE) 2012-02-02 WO claimed
US-20110039983-A1 SURFACE MODIFIED SILICON DIOXIDE PARTICLES NANORESINS AG (DE) 2011-02-17 US claimed
US-6129986-A CONSISTS OF A FLUOROPOLYMER TO WHICH A CYANOETHYLATED ACRYLIC MONOMER IS GRAFTED, AN ALKOXYSILANE COMPOUND HAVING A PRIMARY AMINE GROUP, AN ALCOHOL HAVING 1-4 CARBON ATOMS, AND A FLUORESCENT MATERIAL POWDER SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 2000-10-10 US claimed
US-5444110-A A triazine compound and a plasticizer NIPPON ZEON CO., LTD. (JP) 1995-08-22 US claimed
JP-2019386-A None JP disclosed
US-20230244108-A1 DIMMING LAMINATE AND RESIN SPACER FOR DIMMING LAMINATE SEKISUI CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed
US-11644717-B2 Dimming laminate and resin spacer for dimming laminate SEKISUI CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
CN-115678173-A Composite particle and liquid crystal display device 积水化学工业株式会社 2023-02-03 CN disclosed
CN-108699342-B Composite particle and liquid crystal display device 积水化学工业株式会社 2022-11-01 CN disclosed
EP-3742224-A1 DIMMING LAMINATE AND RESIN SPACER FOR DIMMING LAMINATE SEKISUI CHEMICAL CO., LTD. (JP) 2020-11-25 EP disclosed
EP-0611088-A1 Crosslinkable PVC-plastisol NIPPON ZEON CO., LTD. (JP) 1994-08-17 EP disclosed
US-5320914-A Magnetic recording medium comprising a styrene copolymer or an acrylic copolymer NIPPON ZEON CO., LTD. (JP) 1994-06-14 US disclosed
US-5277984-A Substrates with ferromagnetic material in binders with epoxy groups and silane compounds with amino or thiol groups NIPPON ZEON CO., LTD. (JP) 1994-01-11 US disclosed
US-5153068-A Discoloration inhibition SEKISUI FINE CHEMICAL CO., LTD. (JP) 1992-10-06 US disclosed
EP-0466025-A2 Resist material, method for the production of the same and process of forming resist patterns using the same NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1992-01-15 EP disclosed
US-5075459-A Organosilicon compound TOSHIBA SILICONE CO., LTD. (JP) 1991-12-24 US disclosed
JP-H0219386-A AMINOALKYLSILANE COMPOUND AND PRODUCTION THEREOF TOSHIBA SILICONE CO LTD 1990-01-23 JP disclosed