SCHEMBL52710

SCHEMBL52710

CC1[C]2CC3CC(C2)CC1C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18818440 0.72
SCHEMBL2707599 0.71 CYP2C9 (0.32)
SCHEMBL2722721 0.67
SCHEMBL7391545 0.67
SCHEMBL71654 0.67
SCHEMBL76842 0.67 CYP2C9 (0.41)
SCHEMBL3823884 0.67
SCHEMBL1714862 0.67
SCHEMBL562775 0.67
SCHEMBL5176188 0.63 CYP2C9 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1660 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4377260-A1 A METHOD OF SYNTHESIZING A LOW SAR CHABAZITE ZEOLITE AND THE ZEOLITE OBTAINED THEREBY Johnson Matthey Public Limited Company (GB) 2024-06-05 EP claimed
CN-113582980-B Compound based on heterocyclic ring and glutarimide skeleton and application thereof 上海科技大学 2023-11-24 CN claimed
CN-116500858-A Coating of combined photoresist and Si-based hard mask 上海艾深斯科技有限公司 2023-07-28 CN claimed
US-20230203022-A1 HETEROCYCLE AND GLUTARIMIDE SKELETON-BASED COMPOUND AND APPLICATIONS THEREOF SHANGHAITECH UNIVERSITY (CN) 2023-06-29 US claimed
EP-4144728-A1 HETEROCYCLE AND GLUTARIMIDE SKELETON-BASED COMPOUND AND APPLICATIONS THEREOF Shanghaitech University (CN) 2023-03-08 EP claimed
WO-2023007112-A1 A METHOD OF SYNTHESIZING A LOW SAR CHABAZITE ZEOLITE AND THE ZEOLITE OBTAINED THEREBY JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) 2023-02-02 WO claimed
CN-115443293-A Composition for encapsulating organic light emitting element and organic light emitting display device comprising same 索路思高新材料有限公司 2022-12-06 CN claimed
CN-115160495-A Photoresist film-forming resin containing maleimide structure and preparation method thereof 四川华造宏材科技有限公司 2022-10-11 CN claimed
CN-112239623-B Polymer for display device 罗门哈斯电子材料有限责任公司 2022-10-04 CN claimed
CN-113234194-B Copolymer, primer composition, double-layer system and application of double-layer system in double-layer stripping process 北京科华微电子材料有限公司 2022-08-12 CN claimed
US-20020193542-A1 Photosensitive polymer and chemically amplified photoresist composition containing the same JUNG DONG-WON (KR) 2002-12-19 US claimed
EP-1007518-A4 SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE SEPRACOR INC (US) 2002-11-06 EP claimed
US-6469188-B1 CATALYST SYSTEMS PARTICULARLY USEFUL FOR THE POLYMERIZATION OF POLYPROPYLENE TO GIVE ELASTOMERIC POLYPROPYLENES CALIFORNIA INSTITUTE OF TECHNOLOGY 2002-10-22 US claimed
US-20020076649-A1 Positive resist composition and positive resist base material using the same TOKYO OHKA KOGYO CO., LTD. 2002-06-20 US claimed
US-20020058202-A1 Positive-working photoresist composition and photosensitive material using same TOKYO OHKA KOGYO CO., LTD. (JP) 2002-05-16 US claimed
EP-1091250-A1 Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same Shipley Company LLC (US) 2001-04-11 EP claimed
EP-1007518-A1 SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE SEPRACOR, INC. (US) 2000-06-14 EP claimed
WO-1999009017-A1 SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE SEPRACOR INC. (US) 1999-02-25 WO claimed
EP-0594629-A1 HETEROCYCLIC COMPOUNDS, THEIR PREPARATION AND PHARMACEUTICAL USE BRITISH TECHNOLOGY GROUP LTD (GB) 1994-05-04 EP claimed
WO-1992016507-A1 HETEROCYCLIC COMPOUNDS, THEIR PREPARATION AND PHARMACEUTICAL USE BRITISH TECHNOLOGY GROUP LIMITED (GB) 1992-10-01 WO claimed