Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.64 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.64 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.64 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyridine SCHEMBL27920370 | 0.96 | — | — | |
| Pyridine SCHEMBL9514765 | 0.84 | — | — | |
| Pyridine SCHEMBL28181242 | 0.84 | TSHR (0.90) | TSHRNAPRTTDP1NOTUMMEN1 | |
| Pyridine SCHEMBL97170 | 0.84 | — | — | |
| Pyridine SCHEMBL9514761 | 0.84 | TSHR (0.90) | TSHRNAPRTTDP1NOTUMMEN1 | |
| Pyridine SCHEMBL29109706 | 0.84 | — | — | |
| Pyridine SCHEMBL28721156 | 0.84 | TSHR (0.90) | TSHRNAPRTTDP1NOTUMMEN1 | |
| Pyridine SCHEMBL8494314 | 0.83 | — | — | |
| Pyridine SCHEMBL1410940 | 0.83 | TSHR (0.60) | TSHRNAPRTTDP1NOTUM | |
| Pyridine SCHEMBL28576588 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2007005197-A3 | REMOVAL OF RESIDUES FOR LOW-K DIELECTRIC MATERIALS IN WAFER PROCESSING | TOKYO ELECTRON LTD (JP) | 2007-04-12 | — | — | WO | disclosed |
| WO-2007005197-A2 | REMOVAL OF RESIDUES FOR LOW-K DIELECTRIC MATERIALS IN WAFER PROCESSING | TOKYO ELECTRON LIMITED (JP) | 2007-01-11 | — | — | WO | disclosed |
| US-20070000519-A1 | Removal of residues for low-k dielectric materials in wafer processing | SUPERCRITICAL SYSTEMS, INC. | 2007-01-04 | — | — | US | disclosed |