⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6686 | 0.70 | — | — | |
| SCHEMBL446775 | 0.68 | — | — | |
| SCHEMBL10398116 | 0.67 | — | — | |
| SCHEMBL124324 | 0.67 | — | — | |
| SCHEMBL4256435 | 0.67 | — | — | |
| SCHEMBL1777205 | 0.67 | — | — | |
| SCHEMBL309945 | 0.67 | — | — | |
| SCHEMBL1136669 | 0.67 | — | — | |
| SCHEMBL202964 | 0.67 | — | — | |
| SCHEMBL1498110 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4001263-B1 | CARBAMATE-SUBSTITUTED STYRYL SULFONE COMPOUND, PREPARATION METHOD, AND APPLICATION THEREOF | HUAXIASHENGSHENG PHARMACEUTICAL BEIJING CO LTD (CN) | 2024-03-27 | — | — | EP | claimed |
| EP-0653446-B1 | Curable resin compositions | SHINETSU CHEMICAL CO (JP) | 1998-12-30 | — | — | EP | claimed |
| US-5516868-A | WEATHERABILITY, FLEXIBILITY, ADHERENCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-05-14 | — | — | US | claimed |
| EP-0315954-B1 | Pattern-forming material and pattern formation method | TORAY SILICONE CO (JP) | 1995-11-22 | — | — | EP | claimed |
| US-4985342-A | Semiconductors, Integrated Circuits | TORAY SILICONE COMPANY, LTD. (JP) | 1991-01-15 | — | — | US | claimed |
| EP-0315954-A2 | Pattern-forming material and pattern formation method | TORAY SILICONE COMPANY, LIMITED (JP) | 1989-05-17 | — | — | EP | claimed |
| WO-2023238715-A1 | OIL-IN-WATER TYPE EMULSION COMPOSITION | 信越化学工業株式会社 | 2023-12-14 | — | — | WO | disclosed |
| WO-2023162611-A1 | HYDROPHOBIC CELLULOSE NANOFIBERS, HYDROPHOBIC CELLULOSE NANOFIBER LIQUID DISPERSION, AND COSMETIC | 信越化学工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-110172110-B | Radical-curable organosiloxane-grafted polyvinyl alcohol polymer and method for producing same | 信越化学工业株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-114524936-A | Preparation method of chloromethyl POSS (polyhedral oligomeric silsesquioxane) functionalized modified triphenylamine-based hybrid porous material | 荣往 | 2022-05-24 | — | — | CN | disclosed |
| CN-114524936-A | Preparation method of chloromethyl POSS (polyhedral oligomeric silsesquioxane) functionalized modified triphenylamine-based hybrid porous material | 荣往 | 2022-05-24 | — | — | CN | disclosed |
| EP-3479817-B1 | COSMETIC | SHINETSU CHEMICAL CO (JP) | 2022-05-04 | — | — | EP | disclosed |
| CN-109414396-B | Cosmetic preparation | 信越化学工业株式会社 | 2021-10-29 | — | — | CN | disclosed |
| US-5516868-A | WEATHERABILITY, FLEXIBILITY, ADHERENCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-05-14 | — | — | US | disclosed |
| EP-0315954-B1 | Pattern-forming material and pattern formation method | TORAY SILICONE CO (JP) | 1995-11-22 | — | — | EP | disclosed |
| EP-0653446-A1 | Vinyl copolymers, methods for making them, curable resin compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-05-17 | — | — | EP | disclosed |
| WO-1992008758-A1 | SILICONE SURFACE-MODIFIED AMMONIUM POLYPHOSPHATE | PPG INDUSTRIES, INC. (US) | 1992-05-29 | — | — | WO | disclosed |
| US-5011901-A | Polyorganosiloxane with chloromethyl groups | DOW CORNING TORAY SILICONE (JP) | 1991-04-30 | — | — | US | disclosed |
| US-4985342-A | Semiconductors, Integrated Circuits | TORAY SILICONE COMPANY, LTD. (JP) | 1991-01-15 | — | — | US | disclosed |
| EP-0315954-A2 | Pattern-forming material and pattern formation method | TORAY SILICONE COMPANY, LIMITED (JP) | 1989-05-17 | — | — | EP | disclosed |