⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL2417805 | 1.00 | — | — | |
| Fluoride SCHEMBL509359 | 1.00 | — | — | |
| Fluoride SCHEMBL8446443 | 1.00 | — | — | |
| Fluoride SCHEMBL9649913 | 1.00 | — | — | |
| Fluoride SCHEMBL9130872 | 1.00 | — | — | |
| Fluoride SCHEMBL2162757 | 0.82 | — | — | |
| Fluoride SCHEMBL9130139 | 0.82 | — | — | |
| Fluoride SCHEMBL31241143 | 0.82 | — | — | |
| Fluoride SCHEMBL10010956 | 0.82 | — | — | |
| Fluoride SCHEMBL3988557 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 659 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260082607-A1 | NANOSTRUCTURE PATTERNING FOR MULTI-GATE TRANSISTORS | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2026-03-19 | — | — | US | claimed |
| EP-4273093-B1 | METHOD OF PREPARING SULFURYL FLUORIDE | CONTEMPORARY AMPEREX TECHNOLOGY CO LTD (CN) | 2025-12-10 | — | — | EP | claimed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | claimed |
| WO-2025106306-A1 | SELECTIVE ETCH OF STACK USING HF AND ANOTHER FLUORINE CONTAINING COMPONENT | LAM RESEARCH CORPORATION (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025075828-A1 | SELECTIVE ETCH OF STACK BELOW METAL MASK USING OXYGEN AND FLUORINE | LAM RESEARCH CORPORATION (US) | 2025-04-10 | — | — | WO | claimed |
| WO-2025075834-A1 | SELECTIVE REMOVAL OF REDEPOSITED CARBON MASKS DURING ETCH | LAM RESEARCH CORPORATION (US) | 2025-04-10 | — | — | WO | claimed |
| CN-116253505-B | Blast lamp for polishing surface of device, polishing device and method | 武汉烽火锐拓科技有限公司 | 2025-01-24 | — | — | CN | claimed |
| CN-110656344-B | Device and method for removing water from anhydrous hydrogen fluoride | 贵州理工学院 | 2025-01-03 | — | — | CN | claimed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | claimed |
| CN-118851281-A | Fluoride and preparation method and application thereof | 厦门稀土材料研究所 | 2024-10-29 | — | — | CN | claimed |
| US-5411726-A | Process for purifying hydrogen fluoride | BAYER AG (DE) | 1995-05-02 | — | — | US | claimed |
| EP-0455521-B1 | Enhanced performance of alumina for the removal of low-level fluorine from gas streams | AIR LIQUIDE (FR) | 1994-12-21 | — | — | EP | claimed |
| EP-0344612-B1 | PROCESS FOR PURIFYING NITROGEN TRIFLUORIDE GAS | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-03-17 | — | — | EP | claimed |
| EP-0455521-A1 | Enhanced performance of alumina for the removal of low-level fluorine from gas streams | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 1991-11-06 | — | — | EP | claimed |
| US-5063035-A | ENHANCED PERFORMANCE OF ALUMINA FOR THE REMOVAL OF LOW-LEVEL FLUORINE FROM GAS STREAMS | AMERICAN AIR LIQUIDE (US) | 1991-11-05 | — | — | US | claimed |
| US-4980144-A | REMOVAL HYDROGEN FLUORIDE; THEN OXYGEN DIFLUORIDE USING SODIUM THIOSULFATE, SODIUM SULFIDE, OR HYDROGEN IODIDE | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-12-25 | — | — | US | claimed |
| EP-0344612-A2 | Process for purifying nitrogen trifluoride gas | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-12-06 | — | — | EP | claimed |
| US-3954949-A | Process for making oxygen difluoride | ALLIED CHEMICAL CORPORATION (US) | 1976-05-04 | — | — | US | claimed |
| US-3953585-A | Manufacture of oxygen difluoride | ALLIED CHEMICAL CORPORATION (US) | 1976-04-27 | — | — | US | claimed |
| US-3931132-A | Utilization of oxygen difluoride for syntheses of fluoropolymers | LOW GEORGE M DEPUTY ADMINISTRA | 1976-01-06 | — | — | US | claimed |