⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4599186 | 0.95 | CD81 (0.31) | — | |
| Methacrylic Acid SCHEMBL1237414 | 0.92 | CD81 (0.30) | — | |
| SCHEMBL4541469 | 0.87 | CD81 (0.35) | — | |
| Trimethylammonium SCHEMBL4482732 | 0.84 | HSD17B10 (0.32) | — | |
| SCHEMBL14992900 | 0.83 | CD81 (0.31) | — | |
| Methacrylic Acid SCHEMBL2640986 | 0.82 | CD81 (0.34) | — | |
| SCHEMBL156661 | 0.82 | HSD17B10 (0.35) | — | |
| SCHEMBL156658 | 0.82 | HSD17B10 (0.35) | — | |
| SCHEMBL1237454 | 0.82 | HSD17B10 (0.35) | — | |
| SCHEMBL22600 | 0.82 | CD81 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10754249-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-08-25 | — | — | US | disclosed |
| US-20170285478-A1 | COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2017-10-05 | — | — | US | disclosed |
| US-9690199-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-06-27 | — | — | US | disclosed |
| US-20160223911-A1 | COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY | ROHM & HAAS ELECT MAT (US) | 2016-08-04 | — | — | US | disclosed |
| US-9323154-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2016-04-26 | — | — | US | disclosed |
| EP-1845416-A2 | Coating compositions for photolithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238052-A1 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-10-11 | — | — | US | disclosed |