SCHEMBL5335364

SCHEMBL5335364

[CH]=CCC([CH2])C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20601 0.72
SCHEMBL7874506 0.71
SCHEMBL20523463 0.69
SCHEMBL93184 0.69
SCHEMBL20071 0.69
SCHEMBL8594718 0.69
SCHEMBL6874828 0.67
SCHEMBL4660411 0.67
SCHEMBL8104075 0.67
SCHEMBL10895582 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118201905-A Cationic lipid 武田药品工业株式会社 2024-06-14 CN disclosed
WO-2023085299-A1 CATIONIC LIPID 武田薬品工業株式会社 2023-05-19 WO disclosed
EP-3696901-A1 LITHIUM SECONDARY BATTERY Samsung SDI Co., Ltd. (KR) 2020-08-19 EP disclosed
US-20200259209-A1 ELECTROLTYE AND LITHIUM BATTERY INCLUDING THE ELECTROLYTE SAMSUNG SDI CO., LTD. (KR) 2020-08-13 US disclosed
US-20170355642-A1 MONO- AND BISALKYLENETRIALKOXYSILANE DISPERSANTS FOR HYDRAULIC BINDERS BASF SE (DE) 2017-12-14 US disclosed
EP-3209707-A1 MONO- AND BISALKYLENE TRIALKOXYSILANES AS DISPERSANTS FOR HYDRAULIC BINDERS BASF SE (DE) 2017-08-30 EP disclosed
US-9636643-B2 Polymeric matrices formed from monomers comprising a protected amine group GENERAL ELECTRIC COMPANY (US) 2017-05-02 US disclosed
CN-103260731-B The polysulfonamide film obtained by interfacial polymerization GENERAL ELECTRIC CO. (US) 2016-01-06 CN disclosed
US-20140360932-A1 POLYMERIC MATRICES FORMED FROM MONOMERS COMPRISING A PROTECTED AMINE GROUP BL TECHNOLOGIES, INC. 2014-12-11 US disclosed
US-8839960-B2 Polymeric matrices formed from monomers comprising a protected amine group GENERAL ELECTRIC COMPANY (US) 2014-09-23 US disclosed
EP-0818562-A1 Composition for treating copper and copper alloy surfaces and method for the surface treatment MEC CO., Ltd. (JP) 1998-01-14 EP disclosed
EP-0513580-B1 Alpha-phenyl-acrylic acid derivatives, process for their preparation and their use as parasiticides and fungicides BASF AG (DE) 1996-10-23 EP disclosed
US-5496590-A Composition for treating copper and copper alloy surfaces and method for the surface treatment MEC CO., LTD. (JP) 1996-03-05 US disclosed
US-5416068-A Alpha-phenylacrylic acid derivatives, their preparation and their use for controlling pests and harmful fungi BASF AKTIENGESELLSCHAFT (DE) 1995-05-16 US disclosed
EP-0643154-A2 Composition for treating copper and copper alloy surfaces and method for the surface treatment MEC CO., Ltd. (JP) 1995-03-15 EP disclosed
US-5298527-A Insecticides BASF AKTIENGESELLSCHAFT (DE) 1994-03-29 US disclosed
EP-0348203-B1 PHENOLIC THIOETHERS, THEIR PRODUCTION AND USE SHIONOGI SEIYAKU KABUSHIKI KAISHA trading under the name of SHIONOGI &amp; CO. LTD. (JP) 1993-02-24 EP disclosed
EP-0513580-A2 Alpha-phenyl-acrylic acid derivatives, process for their preparation and their use as parasiticides and fungicides BASF Aktiengesellschaft (DE) 1992-11-19 EP disclosed
US-5084214-A Compounds for the treatment of artheriosclerosis SHIONOGI & CO., LTD. (JP) 1992-01-28 US disclosed
EP-0348203-A1 Phenolic thioethers, their production and use SHIONOGI SEIYAKU KABUSHIKI KAISHA trading under the name of SHIONOGI &amp; CO. LTD. (JP) 1989-12-27 EP disclosed