Fluoride Ion

Fluoride Ion

SCHEMBL5345240

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nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL27900949 0.82 CA4 (0.50)
Fluoride Ion SCHEMBL119083 0.82
Fluoride Ion SCHEMBL29958213 0.82
Fluoride Ion SCHEMBL153119 0.82
Fluoride Ion SCHEMBL3792983 0.82 CA4 (0.50)
Fluoride Ion SCHEMBL28895533 0.82
Fluoride Ion SCHEMBL23406222 0.67
Fluoride Ion SCHEMBL3626675 0.67
Fluoride Ion SCHEMBL11680195 0.67
Fluoride Ion SCHEMBL1310600 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100506879-C Process for producing polyester resins MITSUBISHI GAS CHEMICAL CO (JP) 2009-07-01 CN disclosed
US-7179869-B2 Process for producing polyester resins MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-02-20 US disclosed
CN-1673248-A Process for producing polyester resins MITSUBISHI GAS CHEMICAL CO (JP) 2005-09-28 CN disclosed
US-20050209435-A1 Process for producing polyester resins MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-09-22 US disclosed