SCHEMBL5352373

SCHEMBL5352373

OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1758207 1.00
SCHEMBL5366178 1.00
SCHEMBL7605904 1.00
SCHEMBL29635027 1.00
SCHEMBL1011720 1.00
SCHEMBL30502913 1.00
Hydrochloric Acid SCHEMBL11108560 0.97
Fluoride SCHEMBL31712137 0.97
SCHEMBL5366020 0.97
Alcohol SCHEMBL9727359 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115504869-B Preparation method of fluorine-containing vinyl ether 中蓝晨光化工研究设计院有限公司 2025-01-28 CN claimed
CN-115504869-A Preparation method of fluorine-containing vinyl ether 中蓝晨光化工研究设计院有限公司 2022-12-23 CN claimed
CN-115181495-A Super-amphiphobic super-weather-resistant organic silicon protective coating and preparation method thereof 江苏苏博特新材料股份有限公司 2022-10-14 CN claimed
CN-114058206-A Electron transport layer ink and light emitting device 广东聚华印刷显示技术有限公司 2022-02-18 CN claimed
US-20250154114-A1 MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2025-05-15 US disclosed
CN-115504869-B Preparation method of fluorine-containing vinyl ether 中蓝晨光化工研究设计院有限公司 2025-01-28 CN disclosed
EP-3882235-B1 PRODUCTION METHOD FOR ISOCYANATE COMPOUND UNIV KOBE NAT UNIV CORP (JP) 2025-01-22 EP disclosed
US-20250009941-A1 MEDICAL DEVICE DKS CO. LTD. (JP) 2025-01-09 US disclosed
CN-114423727-B Method for producing fluorine-containing compound AGC株式会社 2024-11-22 CN disclosed
EP-4442287-A1 MEDICAL DEVICE DKS Co. Ltd. (JP) 2024-10-09 EP disclosed
CN-118696625-A Material for metal patterning, heterocyclic compound, thin film for metal patterning, organic electroluminescent element, electronic device, and method for forming metal pattern 东曹株式会社 2024-09-24 CN disclosed
US-12060312-B2 Production method for isocyanate compound NATIONAL UNIVERSITY CORPORATION KOBE UNIVERSITY (JP) 2024-08-13 US disclosed
EP-3882235-A1 PRODUCTION METHOD FOR ISOCYANATE COMPOUND National University Corporation Kobe University (JP) 2021-09-22 EP disclosed
CN-113015719-A Method for producing isocyanate compound 国立大学法人神户大学 2021-06-22 CN disclosed
CN-112759537-A Novel synthesis method of fluorosulfonate surfactant 广东方中高新材料有限公司 2021-05-07 CN disclosed
US-9346920-B2 Water-repellent and oil-repellent composition, and water-repellent film formed by using the composition CANON FINETECH INC. (JP) 2016-05-24 US disclosed
US-20150299469-A1 WATER-REPELLENT AND OIL-REPELLENT COMPOSITION, AND WATER-REPELLENT FILM FORMED BY USING THE COMPOSITION CANON FINETECH NISCA INC. (JP) 2015-10-22 US disclosed
US-8999608-B2 Fluorourethane as an additive in a photopolymer formulation BAYER MATERIALSCIENCE AG (DE) 2015-04-07 US disclosed
US-20120231376-A1 FLUOROURETHANE AS AN ADDITIVE IN A PHOTOPOLYMER FORMULATION BAYER INTELLECTUAL PROPERTY GMBH (DE) 2012-09-13 US disclosed
US-7196121-B2 Inkjet recording ink, solvent for use in said ink and cartridge and recording device having said ink MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-03-27 US disclosed