⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12347400 | 1.00 | — | — | |
| SCHEMBL12189335 | 0.86 | — | — | |
| SCHEMBL19968817 | 0.85 | EPHX2 (0.32) | — | |
| SCHEMBL160292 | 0.85 | EPHX2 (0.32) | — | |
| SCHEMBL24268587 | 0.82 | — | — | |
| SCHEMBL28072351 | 0.82 | — | — | |
| SCHEMBL13447535 | 0.82 | HPGD (0.31) | — | |
| SCHEMBL1155665 | 0.76 | — | — | |
| SCHEMBL98197 | 0.76 | — | — | |
| SCHEMBL23081736 | 0.76 | HPGD (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7625905-B2 | Octahydro-pyrrolo[3,4-c]pyrrole CCR5 receptor antagonists | ROCHE PALO ALTO LLC (US) | 2009-12-01 | — | — | US | disclosed |
| US-20080103125-A1 | Heterocylic antiviral compounds | ROCHE PALO ALTO LLC | 2008-05-01 | — | — | US | disclosed |
| WO-2008034731-A1 | OCTAHYDROPYRROLO [3, 4-C] PYRROLE DERIVATIVES AN THEIR USE AS ANTIVIRAL AGENTS | F. HOFFMANN-LA ROCHE AG (CH) | 2008-03-27 | — | — | WO | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |