SCHEMBL5360602

SCHEMBL5360602

C=C(C)C(=O)n1cnc2ncncc21

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 2/20 0.41
HDAC1 Q13547 1/20 0.39
LTA4H P09960 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6150951 0.82 HDAC6 (0.43) HDAC6HDAC1LTA4H
SCHEMBL4512499 0.77 HDAC6 (0.44) HDAC6HDAC1LTA4H
SCHEMBL4512503 0.77 HDAC6 (0.44) HDAC6HDAC1LTA4H
SCHEMBL27626433 0.76 HDAC6 (0.45) HDAC6HDAC1LTA4H
SCHEMBL2182600 0.76 HDAC6 (0.42) HDAC6HDAC1LTA4H
SCHEMBL5360511 0.71 ADORA2A (0.46)
SCHEMBL19924632 0.71 ASAH1 (0.45) HDAC6HDAC1
Pyrrole SCHEMBL27626493 0.70 HDAC6 (0.40) HDAC6HDAC1LTA4H
SCHEMBL27626492 0.70 HDAC6 (0.39) HDAC6HDAC1LTA4H
Pyrrole SCHEMBL27646717 0.69 HDAC6 (0.39) HDAC6HDAC1LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed