SCHEMBL5363845

SCHEMBL5363845

N[SiH2][SiH2][SiH2]N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL203872 0.57
SCHEMBL6054660 0.57
SCHEMBL6950295 0.54
SCHEMBL1931150 0.54
SCHEMBL17701120 0.46
SCHEMBL555115 0.46
SCHEMBL17686754 0.46
SCHEMBL345483 0.46
SCHEMBL80382 0.46
SCHEMBL15048853 0.46

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118231245-A Method for forming epitaxial layer ASM IP私人控股有限公司 2024-06-21 CN disclosed
US-20240203730-A1 METHOD OF FORMING AN EPITAXIAL LAYER ASM IP HOLDING B.V. (NL) 2024-06-20 US disclosed
US-7192626-B2 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition L'Air Liquide, Société Anonyme á Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2007-03-20 US disclosed