Methacrylic Acid

Methacrylic Acid

SCHEMBL5371507

C=C(C)C(=O)O.OCCOCC(O)O

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.34
ALDH1A1 P00352 2/20 0.33
KDM4E B2RXH2 1/20 0.33
USP2 O75604 1/20 0.33
ALOX15 P16050 1/20 0.33
MAPK1 P28482 1/20 0.33
THRB P10828 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TGFBR1 P36897 1/20 0.32
NOS3 P29474 1/20 0.31
NOS1 P29475 1/20 0.31
NOS2 P35228 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6048438 0.96 MEN1 (0.39) TSHRALDH1A1KDM4EUSP2ALOX15
Methacrylic Acid SCHEMBL6418815 0.87 HSD17B10 (0.45) TSHRALDH1A1KDM4EUSP2ALOX15
Methacrylic Acid SCHEMBL10893406 0.84 HSD17B10 (0.42) TSHRALDH1A1MAPK1THRBMEN1
Methacrylic Acid SCHEMBL9719219 0.84 HSD17B10 (0.42) TSHRALDH1A1MAPK1THRBMEN1
Methacrylic Acid SCHEMBL27839345 0.84 HSD17B10 (0.42) TSHRALDH1A1MAPK1THRBMEN1
Methacrylic Acid SCHEMBL213462 0.84 TSHR (0.32) TSHRALDH1A1MAPK1THRB
Methacrylic Acid SCHEMBL6402976 0.84 USP2 (0.37) TSHRALDH1A1KDM4EUSP2ALOX15
Methacrylic Acid SCHEMBL10909456 0.84 TSHR (0.32) TSHRALDH1A1MAPK1THRB
Di(Hydroxyethyl)Ether SCHEMBL24262 0.83 TSHR (0.50) TSHRALDH1A1MAPK1THRBMEN1
Di(Hydroxyethyl)Ether SCHEMBL10495579 0.83 TSHR (0.50) TSHRALDH1A1MAPK1THRBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US claimed
US-7201978-B2 Magnetic recording medium TDK CORPORATION (JP) 2007-04-10 US disclosed
US-20060115687-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same and magnetic recording medium using the same TDK CORPORATION (JP) 2006-06-01 US disclosed
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US disclosed
US-7001955-B2 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2006-02-21 US disclosed
US-20050118459-A1 Magnetic recording medium TDK CORPORATION (JP) 2005-06-02 US disclosed
US-20040241453-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040241497-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040034165-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2004-02-19 US disclosed
US-6164785-A Antiglaring film DAI NIPPON PRINTING CO., LTD. (JP) 2000-12-26 US disclosed