⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12292895 | 0.75 | — | — | |
| SCHEMBL8566184 | 0.66 | — | — | |
| SCHEMBL14428029 | 0.64 | — | — | |
| SCHEMBL5408931 | 0.64 | — | — | |
| SCHEMBL16522351 | 0.62 | GABRR1 (0.34) | — | |
| SCHEMBL9908429 | 0.61 | MAPT (0.49) | — | |
| SCHEMBL8932049 | 0.61 | — | — | |
| SCHEMBL5390498 | 0.61 | ATM (0.46) | — | |
| SCHEMBL1605392 | 0.61 | ATM (0.46) | — | |
| SCHEMBL10764478 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7192684-B2 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |